DC magnetic filtering cathode vacuum arc plasma source

Abstract

The invention belongs to a plasma source, particularly claims a DC magnetic filtered cathode vacuum arc plasma source. The plasma source is characterized in that a positive bias power supply reduces the loss of the plasma effectively, improves the output efficiency, restrains and stabilizes cathode arc discharging in the cathode head face by using the included angle of the axial magnetic field and the conical cathode inclined plane, so that the invention can work under high vacuum, and the evenness of the plasma entering the vacuum cavity is improved; a resistor can be connected between the water cooling anode cylinder and the water cooling leading-out straight tube, the low plasma output efficiency and the over heat phenomenon of the water cooling leading-out straight tube due to direct grounding of the anode are avoided, thus further improving the output efficiency of the plasma; an air tube can be applied to inflating working gas in the plasma generating area, to participate in plasma discharging, such a method is helpful for depositing high-quality reaction membrane on the work pieces.

Description

technical field [0001] The invention belongs to a metal plasma source, in particular to a plasma source for material surface treatment. Background technique [0002] The deposition of decorative or functional films on metal or non-metal surfaces has developed rapidly in recent years, and people's requirements for decorative and functional films are increasing day by day. Vacuum cathode arc discharge, as a main means of metal plasma generation, is widely used in functional and decorative coatings. However, the generation of metal plasma by vacuum cathode arc discharge is accompanied by the generation of liquid droplets or large particles. The metal plasma generated by conventional small multi-arc target discharge directly faces the workpiece to be processed, resulting in liquid droplets or large particles. It is deposited on the surface of the workpiece, thereby reducing the compactness of the film, the bonding force of the film base, and the brightness of the film. Therefo...

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Problems solved by technology

[0003] At present, straight tube or curved tube filters are mainly used, such as a "vacuum cathode arc straight tube filter" disclosed in Chinese patent CN1632905. Because the straight tube lacks the effect of blocking the line of sight, the filtering effect on large particles is poor; ~90° elbow or S-shaped elbow is applied with an electromagnetic field to form an elbow magnetic filter. Generally, a conventional small multi-arc plane target is directly installed on the magnetic filter, such as a "high vacuum magnetic filter arc" disclosed in Chinese patent CN1459516 Source", because the arc discharge area and the magnetic filter area overlap, the filter magnetic field will affect the arc discharge, the strong magnetic field will affect the stability of the arc discharge, and the reduction of the filter magnetic field strength will greatly reduce the plasma output efficiency

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