Cleaning method of support plate and application thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SUZHOU MAXWELL TECH CO LTD
- Publication Date
- 2022-03-25
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Abstract
Description
technical field
[0001] The application belongs to the technical field of carrier board cleaning, and in particular relates to a method for cleaning a carrier board and its application. Background technique
[0002] In the field of photovoltaic cell manufacturing, the tool used to carry the device is usually used, that is, the carrier plate. The carrier plate is a tool used to carry silicon wafers in the production process of photovoltaic cells. Usually, the silicon wafers are placed in the holes on the carrier plate to realize the simultaneous completion of the upper and lower surfaces of the silicon wafer in a coating machine. For coating, for example, the upper surface is coated with a downward sputtering cathode, and the lower surface is coated with an upward sputtering cathode. The coating film formed on the surface of the silicon wafer is a transparent conductive film, usually an ITO (Indium Tin Oxide, tin-doped indium oxide) film, and of course other types of transpar...