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Exposure value selection method for measuring three-dimensional structured light on surfaces with different reflectivity

A technology of three-dimensional structure and exposure value, which is applied in the direction of measuring devices, optical devices, color TV components, etc., can solve problems such as overexposure, improve measurement efficiency and accuracy, save time for exposure selection, and make selection methods simple Effect

Pending Publication Date: 2022-04-08
无锡图创智能科技有限公司
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  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

In order to measure objects with different reflectivity, a larger exposure range and a longer exposure time are required, and longer exposure times result in overexposure

Method used

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  • Exposure value selection method for measuring three-dimensional structured light on surfaces with different reflectivity
  • Exposure value selection method for measuring three-dimensional structured light on surfaces with different reflectivity
  • Exposure value selection method for measuring three-dimensional structured light on surfaces with different reflectivity

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Embodiment Construction

[0042] The following disclosure provides many different embodiments or examples for implementing different structures of the present invention. To simplify the disclosure of the present invention, components and arrangements of specific examples are described below. Of course, they are only examples and are not intended to limit the invention. Furthermore, the present disclosure may repeat reference numerals and / or reference letters in different instances, such repetition is for simplicity and clarity and does not in itself indicate a relationship between the various embodiments and / or arrangements discussed. In addition, various specific process and material examples are provided herein, but one of ordinary skill in the art may recognize the use of other processes and / or the use of other materials.

[0043] figure 2 A currently commonly used method for determining the best exposure value is given, which includes image acquisition: K1, at the exposure value t k When the se...

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Abstract

The invention discloses an exposure value selection method for measuring three-dimensional structured light on surfaces with different reflectivity, which can avoid area overexposure and improve the accuracy of single optimal exposure coverage pixel measurement, and comprises the following steps of: acquiring an image, obtaining a prediction attempt image, judging whether an overexposure area exists in the prediction attempt image, if not, stopping, and if so, stopping the operation; and if the ratio of qualified pixels in the predicted attempt image is greater than or equal to 95%, multiple exposure selection is carried out, and the multiple exposure selection comprises the steps of S1, exposure initialization, S2, selection of multiple exposures by using a pixel filter, and S3, determination of a next exposure value through optimization, and the steps S1 to S3 are repeatedly executed until the ratio of qualified pixels in the predicted attempt image is greater than or equal to 95%.

Description

technical field [0001] The invention relates to the technical field of machine vision, in particular to a method for selecting exposure values ​​for three-dimensional structured light measurement on surfaces with different reflectances. Background technique [0002] Structured light-based three-dimensional (SL3D) measurement technology is widely used in object tracking, vision-based robot control, and quality inspection due to its high precision and full-scene characteristics. In SL3D measurement, it is necessary to project the sequence phase encoding pattern onto the surface of the target object, and then use the camera in the 3D sensor to collect the deformed fringe pattern carrying depth information, and then use image decoding and triangulation to reconstruct the 3D point cloud of the target object . [0003] At present, SL3D measurement technology is often used to measure the surface of objects with large reflectivity changes. When measuring such objects, areas with h...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H04N5/235G01B11/25
Inventor 葛继刘国营
Owner 无锡图创智能科技有限公司
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