The invention discloses an exposure value selection method for measuring three-dimensional structured light on surfaces with different reflectivity, which can avoid area overexposure and improve the accuracy of single optimal exposure coverage pixel measurement, and comprises the following steps of: acquiring an image, obtaining a prediction attempt image, judging whether an overexposure area exists in the prediction attempt image, if not, stopping, and if so, stopping the operation; and if the ratio of qualified pixels in the predicted attempt image is greater than or equal to 95%, multiple exposure selection is carried out, and the multiple exposure selection comprises the steps of S1, exposure initialization, S2, selection of multiple exposures by using a pixel filter, and S3, determination of a next exposure value through optimization, and the steps S1 to S3 are repeatedly executed until the ratio of qualified pixels in the predicted attempt image is greater than or equal to 95%.