High-flux super-resolution laser direct writing system based on microlens array and DMD

Abstract

The invention discloses a high-flux super-resolution laser direct writing system based on a microlens array and a DMD (Digital Micromirror Device). According to the system, m * m parallel light beams are generated by using a micro lens array comprising m * m lens elements, and 2m * 2m focus dot matrix distribution is formed on a focal plane of an objective lens by combining a light path constructed by an ultraviolet femtosecond laser, a four-beam splitter, a DMD (Digital Micromirror Device), a beam combiner, a flat plate beam displacement element, a lens and the objective lens; the laser direct writing flux based on the microlens array and the DMD is improved to four times of the original flux, the direct writing speed is greatly improved, the light intensity of each focus can be independently adjusted by the DMD, and therefore parallel super-resolution laser direct writing of any graph is achieved in combination with a direct writing algorithm. The method can be applied to rapid processing and manufacturing of micro-lens arrays, diffractive optical elements, photoetching mask plates and the like.

Description

technical field [0001] The invention belongs to the field of optical engineering, in particular to a high-throughput super-resolution laser direct writing system. Background technique [0002] Laser direct writing has the advantages of low cost, no need for vacuum environment, no mask plate, etc., which provides a new method for the processing of micro-nano components, especially the femtosecond laser direct writing technology mainly uses the nonlinear interaction between materials and light to convert the The two-photon absorption range is limited to a high-energy region at the focal point that is smaller than the Airy disk, enabling 3D super-resolution direct writing with feature sizes close to the electron beam exposure level. [0003] With the improvement of the resolution of laser direct writing, its application prospect has been widely concerned, but the direct writing speed has become the main factor limiting its application. Parallel laser direct writing technology ...

AI Technical Summary

Problems solved by technology

The literature [Nature Nanotechnology, 5,637–640(2010)] used DMD and near-field probe arrays to realize parallel direct writing of thousands of beams of light with a resolution of 250nm, but the near-field probes cannot realize three-dimensional processing

In addition, the parallel laser direct writing system based on microlens array and DMD can realize three-dimensional processing, but the number of near-field probes and microlens arrays cannot be further increased, which limits the speed of parallel laser direct writing

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