High resolution ratio micro optical device parallel direct-writing producing method and producing system

A high-resolution, manufacturing method technology, applied in optical components, semiconductor/solid-state device manufacturing, optics, etc., can solve problems such as slow writing speed, high cost, and low resolution
CN101021692AInactive Publication Date: 2007-08-22NAT UNIV OF DEFENSE TECH
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
NAT UNIV OF DEFENSE TECH
Publication Date
2007-08-22
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a high resolution micro optical device parallel direct write making method and system, adopting electric addressing spatial light modulator, implements light intensity modulation by computer control and adopts time fractionizing method to expand dynamic range of exposure, and implement light intensity modulation fractionization and obtains high resolution photoetching exposure of exposure dosage and spatial positions; it adopts a high reduction power optical system based on combination of Fourier transform lens and objective to make the smallest characteristic size of the made micro optical device reach micron and submicron levels. And it uses the pattern splicing technique to make large-sized micro optical devices. And it has inherent parallel characteristic by adopting a method of making surface exposure on patterns one by one, largely increasing making rate and accuracy of micro optical devices and reducing production cost and the device structure is simple and reliable.
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Description

technical field

[0001] The invention relates to the field of manufacturing micro-optical devices, in particular to a high-resolution parallel direct-writing manufacturing method of micro-optical devices and a manufacturing system designed by the method. Background technique

[0002] Laser direct writing technology was proposed in the mid-1980s with the development of large-scale integrated circuits. Although the history is not very long, it has made great progress. In the early 1990s, the laser direct writing system began to be widely used in the production of micro-optical devices, which greatly improved the performance of micro-optical devices and laid a good foundation for the promotion and application of micro-optical technology.

[0003] Most of the existing relatively mature laser direct writing systems are point-by-point exposure, and the size of the direct writing focal spot is micron level, and the smallest feature size that can be realized can only reach the micron...

Claims

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