Laser plasma extreme ultraviolet light source system and extreme ultraviolet light generating method thereof

Abstract

The invention discloses a laser plasma extreme ultraviolet light source system and an extreme ultraviolet light generating method thereof. The system comprises a liquid drop generator, a liquid drop generator, an extreme ultraviolet light source and an extreme ultraviolet light source. The liquid drop generator is used for generating flat target liquid drops; the laser source is used for generating a laser pulse, so that the laser pulse impacts the target liquid drop to generate plasma; the collector is used for collecting EUV light rays radiated by the plasma and focusing and orienting the collected EUV light rays into the scanner. The flat target liquid drop is directly generated through the liquid drop generator, so that the plasma can be generated by only using one laser pulse to impact the target liquid drop, and the number of times of impacting the liquid drop by the laser pulse is reduced, so that the generation of pollutants can be reduced, the severity of pollution of the collector is further reduced, and the service life of the collector is prolonged. Besides, the laser source only needs to generate one laser pulse, and does not need to generate two laser pulses, so that the structure of the laser source can be simplified, and the light beam alignment procedure of the laser source is reduced.

Description

Technical field [0001] The present application relates to the field of semiconductor technology, specifically to a laser plasma polar ultraviolet light source system and a method for generating extreme ultraviolet light. Background [0002] At present, the commonly used ultraviolet (EUV) light source mainly has three types: laser plasma (LPP) light source, gas discharge plasma (DPP) light source and synchrotron radiation light source. [0003] Among them, the working principle of the laser plasma (LPP) light source is the circular droplet flowing from the droplet generator, which is first struck by the front pulse laser into a flat droplet, and then hit by the main pulse laser to generate plasma radiation EUV light, and the EUV light is reflected and focused by the EUV collector and is directed to the middle focus unit and enters the EUV scanner. [0004] However, during the plasma generation process of the droplets after two laser pulses, due to the collision of particles, ions,...

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Problems solved by technology

[0004] However, during the process of generating plasma through the impact of two laser pulses, the EUV collector is seriously polluted and the reflectivity drops rapidly due to the collision of particles, ions, and radiation and the deposition of debris.

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