The invention discloses an
ion isolation device for protecting an off-axis EUV collecting mirror based on an
electromagnetic field. The
ion isolation device comprises an EUV
light source system, a
conical cavity, a direct-
current voltage generator, an
electrode plate, a permanent
magnet, a Mo / Si multilayer film collecting mirror, an EUV camera, a
Faraday cup and a computer, the EUV
light source system is arranged in a vacuum cavity, provides enough energy through
laser, excites a target material, generates
plasma radiation EUV, and generates debris and high-energy ions along with the generation of the debris and the high-energy ions; the
conical cavity isolates the vacuum cavity from the
electrode plate and maintains the air pressure in the cavity stable; the direct-
current voltage generator provides
voltage for the
electrode plates; the electrode plate generates an
electric field; the permanent
magnet generates a
magnetic field, and the
electric field and the
magnetic field act on high-energy ions, so that the ions are deflected, an
isolation effect is achieved, and the Mo / Si multilayer film collecting mirror is protected; the Mo / Si multilayer film collecting mirror focuses an EUV
light spot of
plasma radiation to an IF point; the EUV camera is used for recording the imaging of an IF point and the shape and size of a
light spot; the
Faraday cup is used for recording the beam intensity of the
ion debris; the computer is used for recording, analyzing and calculating images and signals of the EUV camera and the
Faraday cup, adjusting electronic controls such as the displacement table, isolating high-energy ions, preventing the high-energy ions from directly damaging the collecting mirror, and effectively prolonging the service life of the EUV collecting mirror.