A semiconductor device, its manufacturing method, and a high-precision over-temperature protection circuit
A manufacturing method and semiconductor technology, applied in the fields of semiconductor/solid-state device manufacturing, semiconductor devices, electric solid-state devices, etc., can solve the problems of easy aging, poor stability and poor interchangeability of components, and achieve excellent reliability, high integration, Sensitive effect
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[0044] The present invention is further illustrated below in conjunction with the accompanying drawings and specific embodiments. The present embodiment is implemented on the premise of the technical solution of the present invention. It should be understood that these embodiments are only used to illustrate the present invention and not to limit the scope of the present invention.
[0045] like Figures 1 to 7 As shown, an embodiment of the present invention provides a method for fabricating a semiconductor device, including:
[0046] see figure 1 , a substrate 1 of the first conductivity type is provided, and an epitaxial layer 2 is formed on the upper side of the substrate 1 . In the following, the first conductivity type is N-type and the second conductivity type is P-type as an example for specific description.
[0047] see figure 2and the epitaxial layer is divided into a terminal region, a main MOS cell region, a diode region and an isolation region disposed between...
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Abstract
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