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Semiconductor processing technology, vacuumizing device and semiconductor processing equipment

A vacuum device and semiconductor technology, applied in semiconductor/solid-state device manufacturing, mechanical equipment, liquid variable capacity machinery, etc., can solve problems such as poor film quality, reduced vacuum pump performance, and unstable pressure in the process chamber, so as to reduce power consumption. consumption, prevent process instability, and prevent automatic pump stop

Pending Publication Date: 2022-05-27
INST OF MICROELECTRONICS CHINESE ACAD OF SCI +1
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  • Abstract
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AI Technical Summary

Problems solved by technology

However, by-products from the reaction in the process chamber are deposited in the pump, reducing the performance of the vacuum pump
In this case, the process chamber pressure becomes unstable, which in turn leads to poor film quality

Method used

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  • Semiconductor processing technology, vacuumizing device and semiconductor processing equipment

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Embodiment Construction

[0030] In order to make the purposes, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments These are some embodiments of the present invention, but not all embodiments. In the case of no conflict, the embodiments of the present invention and the technical features in the embodiments may be combined with each other. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the protection scope of the present invention.

[0031] In the first aspect, an embodiment of the present invention provides a vacuum device applied to a semiconductor process, refer to figure 1 As shown, the vacuuming device includes a vacuum...

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Abstract

The invention discloses a semiconductor processing technology, a vacuumizing device and semiconductor processing equipment, and is applied to the field of semiconductors, the semiconductor processing technology comprises a vacuum pump body and a heating device, and the heating device comprises an external power supply arranged outside the vacuum pump body; the charging panel is arranged in the vacuum pump body, and the charging panel is charged through an external power supply; the heating structure is arranged on a motor rotor of the vacuum pump body, the heating structure is connected with the charging panel, and the charging panel is used for providing power input for enabling the heating structure to heat. The deposition of by-products in the pump is inhibited by the invention.

Description

technical field [0001] The invention relates to the field of semiconductors, in particular to a semiconductor processing technology, a vacuuming device and semiconductor processing equipment. Background technique [0002] With the recent increase in the use of information media, the demand for semiconductor memory elements has also greatly increased. The equipment for the production of semiconductor products runs smoothly, and there are requirements for mass production of high-quality products. In order to ensure product quality, the process chamber for semiconductor processing should maintain a certain pressure. [0003] In order to maintain constant pressure in the process chamber of semiconductor processing equipment, the ability of the pump to generate vacuum needs to be kept constant. However, by-products from reactions in the process chamber can deposit in the pump, reducing the performance of the vacuum pump. In this case, the chamber pressure becomes unstable, res...

Claims

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Application Information

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IPC IPC(8): F04B37/14F04B39/06H01L21/67
CPCF04B37/14F04B39/06H01L21/67011H01L21/67069
Inventor 徐范植高建峰丁云凌杨涛李俊峰王文武
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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