Heterogeneous direct bonding technology based on pyroelectric effect
A direct bonding and pyroelectric technology, which is applied to thermoelectric devices, circuits, and electrical components with thermal changes in dielectric constant. It can solve the problems of bonding efficiency and bonding effect that need to be improved. Simple operation and simple material effect
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Embodiment 1
[0069] A 128° Y-X cut lithium niobate wafer was used as the first wafer 101 , and a double-throw silicon wafer with a P-type orientation of was used as the second wafer 102 , both of which had a thickness of 500 μm. Use a dicing machine to divide the wafer into a regular size of 20mm×20mm;
[0070] The first wafer 101 and the second wafer 102 with a size of 20mm×20mm were ultrasonically cleaned in acetone for 15 minutes to remove organic pollutants, ultrasonically cleaned in absolute ethanol for 15 minutes to remove inorganic pollutants on the bonding surface, and then rinsed with deionized water Afterwards, dry the wafer surface with nitrogen, and place the cleaned first wafer to be bonded surface 101a and the second wafer to be bonded surface 102a to form a pre-bonded body;
[0071] like image 3 As shown, a piece of 4-inch silicon wafer is placed on the top of the pre-bonded body as the upper gasket 201, and a 2kg weight is added on the upper gasket 201, so that the press...
Embodiment 2
[0074]The only difference between Example 2 and Example 1 is that the maximum temperature of the pre-bonded body is 150°C, 200°C, and 300°C respectively. Other bonding conditions are the same as in Example 1.
Embodiment 3
[0076] The only difference between embodiment 3 and embodiment 1 is that the duration of the pre-bonding body heat preservation stage is 1 hour and 3 hours. Other bonding conditions are the same as in Example 1.
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