Parameterization design method and system for viewing stand

A parametric design and parametric technology, applied in the field of parametric design methods and systems for viewing stands, can solve the problems of insufficient analysis integrity, accuracy and diversity, inability to seat line of sight occlusion loss analysis, limited coverage of line-of-sight analysis, etc. problems, to achieve the effect of reducing the workload of drawing, accurate results, and great flexibility

Pending Publication Date: 2022-07-05
CITIC GENERAL INST OF ARCHITECTURAL DESIGN & RES
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the scheme design process, in order to obtain the optimal grandstand scheme, it is necessary to carry out multi-plan comparison and selection. Considering that there are tens of thousands of grandstands at every turn, the workload of design and drawing is heavy
In addition, convent

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Parameterization design method and system for viewing stand
  • Parameterization design method and system for viewing stand
  • Parameterization design method and system for viewing stand

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0034] The present invention will be further described below with reference to the accompanying drawings:

[0035] 1) Set the outline of the stand field core in the parameterized platform, and use the outline of the stand field core as the edge line of the first row of stands.

[0036] 2) Determine the elevation and horizontal position of the viewpoint according to the specification;

[0037] 3) as figure 1 As shown, enter the first row line, row number, and row distance in the stand raising module-seat line function block to obtain the seat sequence line and row distance;

[0038] 4) as figure 2 As shown, input the seat sequence line and row distance into the stand raising module-integrated stand system function block, and complete the subsequent stand parametric design;

[0039] 5) In the stand raising module-integrated stand system function block, through the viewpoint elevation, the first row elevation, the last row elevation, and the stand modulus, the stand lofting l...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The parameterized design method comprises the following steps: setting a stand field core contour line serving as a first row of stand sideline; determining the elevation and the horizontal position of a viewpoint; generating a group of plane stand seat sequence lines according to the first row of stand sidelines, the row number and the row distance; the sight line rising difference of each row of stands is calculated; the modularized eye position height and the modularized sight line rise difference of each row of stands are calculated; performing up-and-down floating adjustment on the modularized sight line rising difference of the stand; obtaining a grandstand lofting line according to the plane grandstand seat sequence line and the modularized eye position height; carrying out lofting according to a stand lofting line to obtain a volume model; setting a viewpoint trajectory; generating a sight analysis line on the viewpoint guide surface through the viewpoint guide surface, the viewpoint and the eye position points of each row of seats; generating a section with a sight line analysis line; and summarizing various pieces of stand information to a drawing output module, and performing two-dimensional drawing drawing and processing by using Rhino or CAD. According to the method, the stand building scheme meeting design specification requirements can be quickly obtained.

Description

technical field [0001] The invention belongs to the field of computer-aided architectural design, and in particular relates to a parametric design method and system for a viewing stand. Background technique [0002] Performance building refers to most of the buildings with the viewing stand as the core part, including stadiums and theaters. A viewing stand refers to a viewing seat that surrounds the performance or competition venue and rises step by step for large-scale collective activities such as cultural sports and entertainment performances. [0003] The design of the viewing stand is limited by a series of specifications and standards, and the dynamic characteristics of the sight line rise and sight quality level of the stands have a certain professionalism. In the process of program design, in order to obtain the optimal grandstand plan, it is necessary to carry out multi-plan comparison and selection. Considering that there are tens of thousands of viewing stands at...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G06F30/13G06F30/20
CPCG06F30/13G06F30/20Y02E60/00
Inventor 陆晓明李鸣宇杨坤鹏肖瑶孙吉强杨雁申晓艺
Owner CITIC GENERAL INST OF ARCHITECTURAL DESIGN & RES
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap