Internal photoelectric alignment device of evaporator

Abstract

The invention discloses a photoelectric alignment device in an evaporator and relates to the technical field of vacuum coating. The inner photoelectric alignment device of the evaporator is characterized in that the alignment device comprises a shell, a lighting system, a semi-reflecting and semi-transmitting light path, a collimation laser and a power source, the lighting system is arranged on the upper portion of the shell, the semi-reflecting and semi-transmitting light path is arranged in the shell, the collimation laser is horizontally arranged at one end of the shell, and an outlet diaphragm is arranged at the other end of the shell. The inner photoelectric alignment device of the evaporator is scientific in design, convenient to use and reasonable in structure, an operator adjusts the position of a semi-reflecting and semi-transmitting light path to enable light emitted by an LED light source to enter the shielding mechanism and irradiate a crystal oscillation piece, the light can be directly observed through an observation opening or externally connected with a CCD to present the illumination effect and position, and the operation is convenient. And the collimation laser is used for emitting infrared light to generate red light spots, so that observation and adjustment are facilitated, and the positioning accuracy is improved.

Description

technical field [0001] The invention relates to the technical field of vacuum coating, in particular to a method that is used in a limited and narrow space of a coating machine, helps users overcome the limitation of human vision, determines the relative position of an evaporation source crucible and a crystal oscillator plate, and finds and avoids component interference. Photoelectric alignment device inside the evaporation machine. Background technique [0002] On the evaporation equipment, the evaporation source crucible and the crystal probe (crystal oscillator) are in the same vacuum environment, and the central position of the crucible and the crystal oscillator should be relatively fixed. If the position changes or there is spatial interference, it will affect the film performance. , a parameter offset occurs. Multiple evaporation sources (such as main material source and impurity source) are usually set in the vacuum chamber of large-scale coating machines for produ...

AI Technical Summary

Problems solved by technology

[0005] What the present invention aims to solve is the problem that the inner cavity space of the current coating machine is limited, and the positioning of the operator is difficult and inaccurate during maintenance. It provides a method that can be used in the limited and narrow space of the coating machine to help users overcome the limitations of human vision. The relative position of the crucible of the evaporation source and the crystal oscillator of the crystal oscillator, the photoelectric alignment device inside the evaporation machine to find and avoid component interference

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