Asymmetric fast thyristor with strong punch-through
An asymmetric, thyristor technology, used in thyristors, semiconductor devices, electrical components, etc., can solve the problems of low yield, difficult process control, unstable reverse blocking voltage, etc. breaking capacity, reducing the effect of stored charge
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[0024] The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments.
[0025] refer to figure 2 , a structure of the present invention with a strong punch-through asymmetric fast thyristor is that, from top to bottom, a cathode AL layer 10, a cathode P region 22, an N-base region 30, an anode N buffer layer 42, and an anode high-concentration P+ region are arranged in sequence. 41 and the anode AL layer 50, a cathode high concentration N+ region 20 and a P+ region 21 are provided between the cathode AL layer 10 and the cathode P region 22. The depth of the cathode N+ region 20 is 10-20 μm, and the doping concentration is 1×10 19 ~1×10 20 cm -3 ; The depth of the cathode P+ region 21 is 10-20 μm, and the doping concentration is 1×10 18 ~1×10 19 cm -3 ; The depth of the cathode P region 22 is 45 to 140 μm, and the doping concentration is 1×10 14 ~1×10 17 cm -3 ; The thickness of the N-base region 30 is 200...
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