Electron injection enhanced dual-mode MOS controlled thyristor and manufacturing method thereof
An electron injection and enhanced technology, applied in semiconductor/solid-state device manufacturing, circuits, electrical components, etc., can solve the problem that it is difficult to effectively reduce the on-state voltage drop of the device and improve the turn-off speed, and cannot meet the requirements of high-voltage and high-power switching applications, etc. problems, to achieve the effect of easy popularization and utilization, ingenious structural design, and low process cost
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[0029] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.
[0030] refer to figure 1 , the basic structure of the IE-Bi-MCT of the present invention is that the whole device is n - Drift region as substrate, n - A p base area is set in the center above the drift region, and an n base area is set in the center above the p base area. + Cathode area; the p base area is surrounded by an n CS layer (i.e., an n carrier storage layer), and the upper part of the n CS layer is provided with a p ++ shunt area, p ++ The aluminum layer on the upper surface of the shunt area is connected to the aluminum layer on the upper surface of the n+ cathode area to form the cathode electrode K; part n + Cathode region, p base region, n CS layer and part of p ++ A layer of gate oxide layer (i.e. SiO 2 Material layer), a heavily doped polysilicon layer is arranged on the upper surface of the gate oxide layer, and the po...
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