Coated glass with dual function of cutting-off ultraviolet ray / reflecting infrared ray and preparation method thereof
A coated glass, dual-function technology, applied in the field of glass and its preparation, can solve the problems of difficult control of cerium ion addition, complicated process, etc., and achieve the effects of preventing heat transfer from glass, simple and flexible process, and broad prospects.
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example 1
[0016] A method for preparing a coating glass with dual functions of cutting off ultraviolet rays / reflecting infrared rays, comprising the following steps:
[0017] 1). Firstly, after cleaning and drying the glass substrate to be coated, carry out pre-vacuum transition;
[0018] 2). Then the magnetron sputtering method is used to coat the film layer: (1). Two kinds of targets are prepared: the titanium oxide-cerium oxide target is composed of titanium oxide and cerium oxide, and the cerium oxide and titanium oxide in the target The mass ratio is 1 / 3; the transparent wide bandgap semiconductor oxide target is In 2 o 3 and Sn targets, In 2 o 3 : The mass ratio of Sn is 50.0%: 50.0%;
[0019] (2).Magnetron sputtering coating: Carry out magnetron sputtering coating on the glass substrate in pure argon atmosphere, the sputtering pressure is 0.4Pa; The inner film is sputtered and the thickness of the film is 210nm. On this basis, In 2 o 3 Continue coating with Sn target to ge...
example 2
[0023] A method for preparing a coating glass with dual functions of cutting off ultraviolet rays / reflecting infrared rays, comprising the following steps:
[0024] 1). Firstly, after cleaning and drying the glass substrate to be coated, carry out pre-vacuum transition;
[0025] 2). Then the magnetron sputtering method is used to coat the film layer: (1). Two kinds of targets are prepared: the titanium oxide-cerium oxide target is composed of titanium oxide and cerium oxide, and the cerium oxide and titanium oxide in the target The mass ratio is 1 / 3; the transparent wide bandgap semiconductor oxide target is In 2 o 3 and Sn targets, In 2 o 3 : The mass ratio of Sn is 99.0:1.0;
[0026] (2). Magnetron sputtering coating: Carry out magnetron sputtering coating on the glass substrate in the oxygen-argon mixed gas atmosphere, the sputtering pressure is 0.4Pa, and the mass ratio of the argon-oxygen mixed gas during sputtering is oxygen: argon =1:20; Firstly, the inner layer fi...
example 3
[0030] A method for preparing a coating glass with dual functions of cutting off ultraviolet rays / reflecting infrared rays, comprising the following steps:
[0031] 1). Firstly, after cleaning and drying the glass substrate to be coated, carry out pre-vacuum transition;
[0032] 2). Then the magnetron sputtering method is used to coat the film layer: (1). Two kinds of targets are prepared: the titanium oxide-cerium oxide target is composed of titanium oxide and cerium oxide, and the cerium oxide and titanium oxide in the target The mass ratio of ZnO: Al is 3 / 2; the transparent wide bandgap semiconductor oxide target material is ZnO and Al target material, and among the ZnO and Al target material, the mass ratio of ZnO:Al is 85.0%%:15.0%;
[0033] (2). Magnetron sputtering coating: Carry out magnetron sputtering coating on the glass substrate in the oxygen-argon mixed gas atmosphere, the sputtering pressure is 0.4Pa, and the mass ratio of the argon-oxygen mixed gas during sputt...
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