Anticmicrobial denture cleaning compositions

A cleaning composition, a technology for the composition, applied in the direction of gasification substances, separation methods, liquid degassing, etc.

Inactive Publication Date: 2002-03-13
PROTECH PROFESSIONAL PROD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this small amount of benzoate is not sufficient to provide sufficient antibacterial activity to the composition

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach

[0040] In order to illustrate the practice of the present invention, various denture cleaning compositions according to the concepts of the present invention were prepared. Each embodiment of the present invention comprises about 85% potassium monopersulfate commercially available under the trade designation "OXONE", about 12% by weight of a sequestering agent, i.e. sodium citrate, and about 3% by weight antibacterial agent, sodium benzoate. Minor amounts of flavoring agents (<0.1% by weight) may also be part of the composition.

[0041] Sample powders and denture fragments (4 cm x 0.3 cm x 2 cm) of the composition were provided to test the antibacterial activity of the composition in solution over a 7 day period against the following known bacteria: Actinomyces viscosus (ATCC 15987), Candida albicans bacteria (ATCC 10231), Streptococcus pyogenes (ATCC25175) and Streptococcus mutans (ATCC12344).

[0042] Streptococcus mutans and S. pyogenes were grown in trypticase soy broth...

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PUM

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Abstract

A denture cleansing composition includes a monoperoxysulfate compound, an effective amount of a sequestering agent, such as a citrate compound, for removal of calculus and to provide a pH to the composition in solution (water) of about 3 to 5, and an effective amount of an antimicrobial agent, such as a benzoate compound, to provide antimicrobial activity to the composition to effectively kill bacteria, or other microorganisms found on the dentures. Tests conducted show that the composition is particularly effective in killing microbial strains of Streptococcus mutans, Streptococcus pyogenes, Candida albicans and Actinomyces viscosus within 20 minutes of contact.

Description

technical field [0001] The present invention relates to a denture cleaning composition and, more particularly, to a denture cleaning composition having improved antimicrobial activity compared to other denture cleaning compositions. In particular, the present invention relates to a safe and effective composition suitable for use as a denture cleanser comprising a monopersulfate compound, a sequestrant and an antimicrobial agent, such as a benzoate compound, each group Together, they effectively kill bacteria and other microorganisms commonly found on dentures. Background of the invention [0002] Denture buildup or calculus occurs due to the denture wearer's oral secretions. The parotid gland secretes substances through the parotid duct located between the first and second molars. The mandibular gland secretes other substances through the submandibular duct located under the tongue. Finally, the hypolingual canal is secreted by the sublingual ductules located at the level...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/00A61K8/22A61K8/23A61K8/36A61K8/365A61K8/368A61L9/04A61Q11/02A62D3/00B01D19/00
CPCA61Q17/005A61Q11/02A61K8/22
Inventor C·D·沃特金斯
Owner PROTECH PROFESSIONAL PROD
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