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Method and device for cleaning material surface by microwave

A cleaning device and cleaning technology, applied in the directions of cleaning methods and utensils, cleaning flexible items, chemical instruments and methods, etc., can solve the problems of not wide application area and limited cleaning degree, achieve wide application range and improve surface work function. , the effect of optimizing electrode performance

Inactive Publication Date: 2003-10-22
上海复孵科技有限公司
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  • Abstract
  • Description
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Problems solved by technology

Although the use of ozone or oxygen plasma to treat the sample surface is a conventional technique, its cleanliness is limited and its application is not wide

Method used

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  • Method and device for cleaning material surface by microwave
  • Method and device for cleaning material surface by microwave
  • Method and device for cleaning material surface by microwave

Examples

Experimental program
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Embodiment

[0013] The structure of the device is as figure 2 As shown, a frequency conversion microwave oven is used to process a stainless steel chassis 9, process and prepare an ultraviolet lamp 3 without electrodes, put it on the stainless steel chassis 9, and install the stainless steel chassis at the bottom of the microwave oven cavity. 22 centimeters of glass plates 8 are buckled upside down on the stainless steel chassis 9 as a glass cover, and the edge of the glass cover is cushioned with a special rubber sealing ring 10 . Connect the gas inlet and outlet ports 4 and 5 to the rear panel of the microwave oven and to an external gas flow controller. The gas flow controller is connected to high-purity oxygen and the gas outlet is connected to a mechanical vacuum pump. In this way, the vacuum degree of the sealed chamber in the glass disc can be controlled, and the equipment can be subjected to oxygen plasma treatment (1-10Pa) by controlling the vacuum degree. More conveniently, oz...

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Abstract

The present invention relates to a method for cleaning material surface of organic substance, dust and steam pollution by utilizing microwave to produce UV-ray / ozone or oxygen plasma. Said method is suitable for cleaning surface of insulator and semiconductor material, specially is suitable for cleaning surface of conductive glass. Said invention can utilize general microwave and make it into theequipment capable of producing microwave ozone / oxygen plasma treatment. Said equipment also can be used for making disinfection and removing organic abnormal smell, etc.

Description

technical field [0001] The invention belongs to a material surface cleaning method and a device thereof, in particular to a method and a device for cleaning material surface pollution by using microwaves to generate ultraviolet light, ozone or oxygen plasma. The method and device are especially suitable for removing various pollutions on the surface of conductive glass. Background technique [0002] In the industrial production of semiconductors and various devices, surface cleaning is a crucial technology in the device preparation process. The quality of surface cleaning treatment is directly related to the performance and yield of the device. For example, a transparent electrode, also known as transparent conductive glass or ITO glass, is widely used in industries such as organic light-emitting devices, liquid crystal display devices, and sensors, which is made of indium tin oxide (ITO) deposited on a glass substrate. . When ITO transparent conductive glass is used as a...

Claims

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Application Information

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IPC IPC(8): B08B11/00
Inventor 侯晓远钟高余王晓军熊祖洪史华忠张松涛何钧丁训民
Owner 上海复孵科技有限公司
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