Oxygen transport membrane for silicon oxide plant

A technology of silicon dioxide and silicon oxidation, which is applied in the preparation of silicon oxide, silicon dioxide and oxygen to achieve the effect of promoting effective purification

Inactive Publication Date: 2003-11-12
PRAXAIR TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

None of these patents disclose the use of ceramic membranes for oxygen purification in combination with silicon oxidation equipment

Method used

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  • Oxygen transport membrane for silicon oxide plant
  • Oxygen transport membrane for silicon oxide plant
  • Oxygen transport membrane for silicon oxide plant

Examples

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Embodiment 1

[0059] The calculations of this example were performed under the assumption that an oxygen transport membrane cell was used to produce ultra-high purity oxygen at 5 L / min. For the purposes of these calculations, the membrane used is a mixed conductor ceramic membrane with the following properties:

[0060] Membrane properties on porous substrates

[0061] thin oxygen selective membrane

[0062] Substrate porosity 40%

[0063] Effective film thickness 40microns

[0064] Oxygen ion conductivity 0.5s / cm

[0065] Operating temperature (isothermal) 900°C

[0066] These models represent some of the different possible configurations assuming the ceramic membrane tube is made 6 feet long and 1 inch in diameter. By minimizing the total number of ceramic membrane tubes that must be employed, and maximizing oxygen recovery, these configurations are achievable with low capital capital and low additional operating costs....

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Abstract

An integrated system for producing high purity silicon dioxide comprising: a) a source of an oxygen-containing feed gas containing at least one impurity, b) an oxygen transport membrane cell containing an oxygen-selective transport membrane that has a cathode side and an opposing anode side, the membrane being at an elevated temperature effective for separation of oxygen in the feed gas from the impurity by transporting oxygen ions from the oxygen-containing feed gas through the membrane to the anode to form a purified oxygen permeate on the anodeside, while retaining an essentially oxygen-depleted, impurity-containing retentate on the cathode side, c) a passageway from the source (a) to the cathode side of the membrane cell, d) a silicon source, and e) a silicon oxidation furnace, in communication with the anode side of the membrane cell, for reaction of the purified oxygen permeate with silicon from the silicon source, at an elevated reaction temperature effective for the reaction, in order to produce the high purity silicon dioxide.

Description

field of invention [0001] The present invention relates to an integrated system comprising an oxygen selective ion transport membrane in conjunction with a silicon oxidation furnace to provide ultra high purity oxygen to the furnace as a reactant for the production of high purity silica coatings . This integrated system offers a particular advantage because the heat source applied to the efficient operation of the silicon oxidation furnace is also adapted to provide the high temperatures required for efficient operation of the membrane, thus ensuring the generation of the desired high purity oxygen infiltration. Background of the invention [0002] Silicon dioxide is a key ingredient in the manufacture of semiconductors. Conventional methods of oxidizing silicon to form silica typically employ oxygen-containing reactants, such as oxygen, air, steam or mixtures thereof, in furnaces operated at elevated temperatures, such as from about 900°C to about 1...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/12B01D53/22C01B13/02C01B33/18
CPCB01D2257/104B01D53/22C01B13/0251C01B33/18C01B2210/0046C01B33/113
Inventor K·B·阿尔保N·R·克斯卡
Owner PRAXAIR TECH INC
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