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Semiconductor storage device

A storage device and semiconductor technology, applied in semiconductor devices, information storage, semiconductor/solid-state device manufacturing, etc., can solve problems such as large storage cells, and achieve the effect of reducing the plane size

Inactive Publication Date: 2004-02-18
MITSUBISHI ELECTRIC CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But in SRAM, each memory cell must form 6 transistors on the silicon substrate
So there is the problem that the memory cell is particularly large compared to DRAM

Method used

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  • Semiconductor storage device
  • Semiconductor storage device
  • Semiconductor storage device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] In FIG. 1, an element isolation region 2 is provided on a silicon substrate 1 for separating each element region. An n-type well 3 and a p-type well 4 are provided in the silicon substrate 1 on the lower side of the element region. In addition, a gate oxide film 5 is provided adjacent to the silicon substrate area where the transistor is formed. Doped polysilicon 6 is provided on gate oxide film 5, and WSi layer 7 is disposed thereon. Next, a silicon oxide film-silicon nitride film 8 is laminated on the WSi layer 7 . Gate electrode 9 is arranged as a portion including doped polysilicon 6 , WSi layer 7 , and silicon oxide film-silicon nitride film 8 described above. The side surfaces of the gate electrode 9 are insulated by side walls 10, and the upper surface thereof is insulated by a silicon oxide film-silicon nitride film 8.

[0027] An n+ type source and drain region 11 is arranged on the p type well 4 , and a p+ type source and drain region 12 is arranged on the ...

Embodiment 2

[0052] In the semiconductor storage device in Embodiment 2 of the present invention shown in FIG. 8, only the gate oxide film 24 and TFT 25 shown in FIG. same. According to FIG. 8, an access transistor T6 is formed on a silicon substrate, and a capacitor 32 (C2) is formed thereon. The source-drain region 11 of the access transistor T6 is electrically connected to the storage node 30 of the capacitor 32 ( C2 ) through the conductive paths 14 , 15 , 27 , 28 penetrating the interlayer insulating films 13 , 18 , 21 , 44 , 26 . Also, the gate electrode of the transistor T1, the interlayer silicon oxide film 44, and the high-resistance polysilicon 45 (R2) are connected by an interposer wiring.

[0053] Figure 9 Among them, the source S of the access transistor T5 whose drain D is connected to the bit line BL is electrically connected to the storage node 30 of the capacitor C1, forming a part corresponding to a memory cell of a conventional DRAM. The source S of access transistor...

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PUM

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Abstract

A semiconductor memory device having as its main storage portion a capacitor storing charges as binary information and an access transistor controlling input / output of the charges to / from the capacitor, and eliminating the need for refresh, is obtained. The semiconductor memory device includes a capacitor (32) with a storage node (30) located above a semiconductor substrate (1) and holding the charges corresponding to a logical level of stored binary information, an access transistor (T5, T6) located on the semiconductor substrate surface and controlling input / output of the charges accumulated in the capacitor, and a latch circuit located on the semiconductor substrate and maintaining a potential of the capacitor storage node. At least one of circuit elements (T1, T2, T3, T4, R1, R2) constituting the latch circuit is located above the access transistor.

Description

technical field [0001] The present invention relates to a semiconductor storage device, and more particularly to a DRAM (Dynamic Random-Access Memory: Dynamic Random-Access Memory) that does not require refreshing. technical background [0002] The structure of a conventional DRAM memory cell will be described below with reference to FIG. 11 . [0003] In this figure, an element isolation region 102 is provided on a silicon substrate 101 for isolating each element region. An n-type well 103 and a p-type well 104 are provided in the silicon substrate 101 on the lower side of the device region, and a gate oxide film 105 is provided next to the silicon substrate where the device is formed. Doped polysilicon 106 is provided on the gate oxide film 105, and a WSi layer 107 and a double-layer film 108 composed of a silicon oxide film and a silicon nitride film are disposed on the doped polysilicon 106. The gate electrode 109 includes the above-described doped polysilicon 106 , WS...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/108G11C11/402G11C11/412H01L21/8242H01L21/8244H01L27/11
CPCH01L27/10844G11C11/412H01L27/108H01L27/1108G11C11/4023H01L27/11H10B12/01H10B12/00H10B10/00H10B10/125
Inventor 古贺刚石垣佳之芦田基牧幸生藤井康博细川智广寺田隆司出井诚增田泰一
Owner MITSUBISHI ELECTRIC CORP