Semiconductor storage device
A storage device and semiconductor technology, applied in semiconductor devices, information storage, semiconductor/solid-state device manufacturing, etc., can solve problems such as large storage cells, and achieve the effect of reducing the plane size
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Embodiment 1
[0026] In FIG. 1, an element isolation region 2 is provided on a silicon substrate 1 for separating each element region. An n-type well 3 and a p-type well 4 are provided in the silicon substrate 1 on the lower side of the element region. In addition, a gate oxide film 5 is provided adjacent to the silicon substrate area where the transistor is formed. Doped polysilicon 6 is provided on gate oxide film 5, and WSi layer 7 is disposed thereon. Next, a silicon oxide film-silicon nitride film 8 is laminated on the WSi layer 7 . Gate electrode 9 is arranged as a portion including doped polysilicon 6 , WSi layer 7 , and silicon oxide film-silicon nitride film 8 described above. The side surfaces of the gate electrode 9 are insulated by side walls 10, and the upper surface thereof is insulated by a silicon oxide film-silicon nitride film 8.
[0027] An n+ type source and drain region 11 is arranged on the p type well 4 , and a p+ type source and drain region 12 is arranged on the ...
Embodiment 2
[0052] In the semiconductor storage device in Embodiment 2 of the present invention shown in FIG. 8, only the gate oxide film 24 and TFT 25 shown in FIG. same. According to FIG. 8, an access transistor T6 is formed on a silicon substrate, and a capacitor 32 (C2) is formed thereon. The source-drain region 11 of the access transistor T6 is electrically connected to the storage node 30 of the capacitor 32 ( C2 ) through the conductive paths 14 , 15 , 27 , 28 penetrating the interlayer insulating films 13 , 18 , 21 , 44 , 26 . Also, the gate electrode of the transistor T1, the interlayer silicon oxide film 44, and the high-resistance polysilicon 45 (R2) are connected by an interposer wiring.
[0053] Figure 9 Among them, the source S of the access transistor T5 whose drain D is connected to the bit line BL is electrically connected to the storage node 30 of the capacitor C1, forming a part corresponding to a memory cell of a conventional DRAM. The source S of access transistor...
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