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Electronic projection photoetching device using secondary electronic

A secondary electronic and electronic technology, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, discharge tube/lamp parts, etc., can solve the problems of reduced resolution, inconvenient, large lithography device, etc.

Inactive Publication Date: 2004-05-19
SAMSUNG ELECTRONICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, in the conventional electron projection lithography apparatus having the above structure, the electron gun is installed separately, so that the lithography apparatus is large and inconvenient
Also, conventional projection electron lithography setups do not include components to create a magnetic field, so that when a pattern is projected on a substrate at a 1:1 ratio, resolution is reduced

Method used

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  • Electronic projection photoetching device using secondary electronic
  • Electronic projection photoetching device using secondary electronic

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Embodiment Construction

[0016] The present invention will be described in detail below by describing preferred embodiments in conjunction with the accompanying drawings. figure 1 Schematically illustrates the structure of an electron projection lithography apparatus utilizing secondary electrons according to a preferred embodiment of the present invention. refer to figure 1 , the substrate 10 coated with the electronic resist 14 is placed on the substrate holder 12 . The secondary electron emitter 20 is spaced apart from the substrate 10 by a predetermined distance, and a patterned mask 22 is formed on a surface of the secondary electron emitter 20 facing the substrate holder 12 . The primary electron emitter holder 30 is spaced apart from the secondary electron emitter 20 by a predetermined distance in a direction in which the secondary electron emitter faces away from the substrate holder 12 . The primary electron emitter 32 is formed on the side of the primary electron emitter holder 30 facing t...

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Abstract

An electron projection lithography apparatus using secondary electrons includes a secondary electron emitter which is spaced apart from a substrate holder by a first predetermined interval and has a patterned mask formed on a surface thereof to face the substrate holder, a primary electron emitter which is spaced apart by a second predetermined interval from the secondary electron emitter in a direction opposite to the substrate holder and emits primary electrons to the secondary electron emitter, a second power supply which applies a second predetermined voltage between the substrate holder and the secondary electron emitter, a first power supply which applies a first predetermined voltage between the secondary electron emitter and the primary electron emitter, and a magnetic field generator which controls a path of secondary electrons emitted from the secondary electron emitter.

Description

technical field [0001] The present invention relates to an electron projection lithography apparatus utilizing secondary electrons, and more particularly, the present invention relates to an electron lithography apparatus utilizing secondary electrons in which voltage is supplied using cold emission technology and electrons are emitted at room temperature to thereby Primary electrons are emitted to inject the primary electrons into the emitter, and secondary electrons are emitted in areas exposed by the patterned blocking mask formed on the surface of the emitter to project the secondary electrons onto the substrate. Background technique [0002] Electron projection lithography implements the exposure process by emitting electrons from an emitter and projecting the electrons onto an electron resist spaced a predetermined distance from the emitter. US Patent No. 6,476,402 discloses an electron projection lithography apparatus in which electrons are emitted by heating a thermo...

Claims

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Application Information

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IPC IPC(8): G03F7/20H01J1/00H01J31/00H01J37/073H01J37/147H01J37/305H01J37/317H01L21/027
CPCB82Y10/00H01J37/3175H01J2237/31781H01J2237/06358B82Y30/00B82Y40/00G03F7/20B82B3/00
Inventor 柳寅儆文昌郁金东煜
Owner SAMSUNG ELECTRONICS CO LTD