Method for producing color filter
A technology of color filter and manufacturing method, applied in optics, optical components, microlithography exposure equipment, etc., can solve problems such as interference, incomplete shading, and unsatisfactory thickness control.
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[0029] Please refer to Fig. 2 (a) to (e), which is a flow chart of a preferred embodiment of the manufacturing method of the color filter of this case.
[0030] First, as shown in FIG. 2(a), a transparent and planarized dielectric layer 202 is formed on a semiconductor substrate 201, and then a color pixel with a pattern ratio of 25% is formed on the dielectric layer 202, for example Blue pixel 2031. The formation method is to coat a layer of blue photoresist on the dielectric layer 202, which is a blue dye (pigment) negative photoresist, and then perform an exposure process and a development process to harden the exposed blocks , so that the blue photoresist is transformed into many blocky blue pixels 2031, as shown in FIG. 3(a).
[0031] Next, as shown in FIG. 2( b ), another color pixel with a pattern ratio of 25%, such as a red pixel 2032 , is formed. The formation method is to coat a layer of red photoresist on the dielectric layer 202 and the blue pixel 2031. This red ...
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