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Substrate treatment equipment and treatment method thereof

A substrate processing device and substrate technology, applied in spraying devices, spraying devices, cleaning methods and tools, etc., can solve the problems of large volume of wet cleaning equipment, health hazards of operators, etc., shorten the man-hours of film removal and improve safety , The effect of reducing manufacturing costs

Active Publication Date: 2010-12-01
K C TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above-mentioned polyimide has strong corrosion resistance to chemicals, and it takes considerable time to completely remove the defective film
In addition, wet cleaning equipment is bulky and is very harmful to the health of operators due to the large amount of toxic chemicals used in the operation process

Method used

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  • Substrate treatment equipment and treatment method thereof
  • Substrate treatment equipment and treatment method thereof
  • Substrate treatment equipment and treatment method thereof

Examples

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Abstract

To provide a substrate processing unit that can quickly and easily remove physical films and a substrate processing method therefor. This substrate processing unit comprises a loading portion for loading a substrate formed with physical films, a dry ice supply portion for providing dry ice particles or carbonic anhydride, a spray portion for spraying the dry ice particles supplied from the dry ice supply portion via one or more nozzles or solidifying the carbonic anhydride and spraying it onto the substrate for primary surface treatment of the physical films and a surface treatment portion for selectively removing the physical films subjected to primary surface treatment.

Description

Substrate processing device and processing method thereof technical field The present invention relates to a substrate processing device and a processing method thereof, in particular to a substrate processing device and a processing method capable of easily removing the modified substance film by modifying a substance film to be removed and then cleaning or etching. Background technique Generally, LCD (liquid crystal display) is a kind of substrate, which includes: a substrate area, which includes thin film transistors and transparent electrodes; a liquid crystal area, located on the substrate area and polarizing; a color filter area, located on the liquid crystal area and determining the color . In the process of manufacturing the above LCD, vacuum evaporation and patterning of thin films are repeated. In the process of vacuum coating or pattern formation, if the film is abnormal, it is not discarded, but reworked. The existing reprocessing process is to use wet clea...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B7/00C23C14/02
CPCB05B1/02H01L21/67028H01L21/67051
Inventor 金世镐朴钟秀尹哲男
Owner K C TECH
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