Developing treatment apparatus and developing treatment method

A technology of processing device and processing unit, which is applied in the direction of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., which can solve problems such as developing defects, uneven developing, and uneven concentration of developer, so as to suppress the generation of particles and stabilize the developer , Yield improvement effect
CN1908819AInactive Publication Date: 2007-02-07TOKYO ELECTRON LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
TOKYO ELECTRON LTD
Publication Date
2007-02-07
Estimated Expiration
Not applicable · inactive patent

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Abstract

In the present invention, a substrate transfer unit from which a substrate is transferred from / to the outside of a treatment container and a developing treatment unit in which development of the substrate is performed are arranged side by side in the treatment container, and a carrier mechanism is provided which carries the substrate while grasping an outside surface of the substrate from both sides, between the substrate transfer unit and the developing treatment unit. A developing solution supply nozzle for supplying a developing solution onto the substrate and a gas blow nozzle for blowing a gas to the substrate, are provided between the substrate transfer unit and the developing treatment unit and above a carriage path along which the substrate is carried, and a cleaning solution supply nozzle is provided in the developing treatment unit for supplying a cleaning solution onto the substrate. According to the present invention, since the substrate is carried with its outside surface being grasped, spread of contamination can be prevented to restrain generation of particles in the treatment container.
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Description

technical field

[0001] The present invention relates to a development treatment device and a development treatment method of a substrate. Background technique

[0002] For example, in a photolithography process of a semiconductor device manufacturing process, for example, a development process is performed to develop a wafer exposed according to a predetermined pattern. This development treatment is usually performed in a development treatment device. In this development processing apparatus, for example, a wafer is rotated by a spin chuck, a developer is supplied to the wafer from a developer supply nozzle, and a developer liquid film is formed on the front surface of the wafer to develop the wafer.

[0003] However, the above-mentioned development processing apparatus needs to rotate the wafer, so a high-torque spin motor must be used for the spin chuck. Therefore, the motor takes up a lot of space, resulting in a bulky development processing device. In addition, the el...

Claims

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