39results about How to "Uniform development" patented technology

In the present invention, a substrate transfer unit from which a substrate is transferred from / to the outside of a treatment container and a developing treatment unit in which development of the substrate is performed are arranged side by side in the treatment container, and a carrier mechanism is provided which carries the substrate while grasping an outside surface of the substrate from both sides, between the substrate transfer unit and the developing treatment unit. A developing solution supply nozzle for supplying a developing solution onto the substrate and a gas blow nozzle for blowing a gas to the substrate, are provided between the substrate transfer unit and the developing treatment unit and above a carriage path along which the substrate is carried, and a cleaning solution supply nozzle is provided in the developing treatment unit for supplying a cleaning solution onto the substrate. According to the present invention, since the substrate is carried with its outside surface being grasped, spread of contamination can be prevented to restrain generation of particles in the treatment container.

An ink jet printing method includes the steps of: shooting an ink containing a color material in a penetrant by ink jet method to a surface of a print medium; and supplying only a penetrant containing no color material at a position on the print medium corresponding to a position at which the ink has been shot to diffuse the supplied penetrant in the print medium in order to control distribution of the color material supplied in the print medium as the ink is shot at the print medium.

In the present invention, a substrate transfer unit into / from which a substrate is transferred from / to the outside of a treatment container and a developing treatment unit in which development of the substrate is performed are arranged side by side in the treatment container, and a carrier mechanism is provided which carries the substrate while grasping an outside surface of the substrate from both sides, between the substrate transfer unit and the developing treatment unit. A developing solution supply nozzle for supplying a developing solution onto the substrate and a gas blow nozzle for blowing a gas to the substrate, are provided between the substrate transfer unit and the developing treatment unit and above a carriage path along which the substrate is carried, and a cleaning solution supply nozzle is provided in the developing treatment unit for supplying a cleaning solution onto the substrate. According to the present invention, since the substrate is carried with its outside surface being grasped, spread of contamination can be prevented to restrain generation of particles in the treatment container.

A processing apparatus for a lithographic printing plate, which has a photosensitive material coated thereon and has an image formed with an FM screen or a high definition AM screen, by a developing part and a rinsing part in this order, in which a concavo-convex part or grooves are provided on a lower roller of a pair of feeding roller at a feeding port of the rinsing part.

An ion mobility spectrometer is provided with at least one ionization chamber (1) through which analyte-containing gas can flow. A radiation source (2) is provided from which ionizing radiation is suitable for ionizing the analyte-containing gas at least partially, enters the ionization space (1). A separation area is located behind the ionization space (1) in the direction of flow, into which the partially ionized gas is admitted as an ion carrier gas (4) and a nearly ion-free gas is admitted as a drift gas (5) in such a way that a flow in which predominantly ion carrier gas (4) flows through cross-sectional areas (6) and predominantly drift gas (5) flows through other cross-sectional areas (7, 7′), becomes established at least in the inlet area of the separation area (8). The drift gas (5) and ion carrier gas (4) flow unidirectionally and the cross-sectional areas (6), through which predominantly ion carrier gas (4) flows, are smaller in at least one dimension than the cross-sectional areas (7, 7′), through which predominantly drift gas (5) flows.

The invention provides a developing unit, belonging to the field of display technology. The developing unit solves the problem of difference of developing images at different positions in an existing large-size base plate developing process. The developing unit enables the different parts of a base plate to be subjected to uniform developing due to at least one interactive inclining motion of the base plate in the developing process, and therefore, a uniform image can be formed; besides, the angle of the interactive inclining motion can be freely adjusted, so that developing residues can be timely removed and the developing speed and the developing quality can be promoted.

A thermal developing apparatus for visualizing a latent image recorded on a photosensitive thermal developing recording material by heating the photosensitive thermal developing recording material with heating unit while conveying the photosensitive thermal developing recording material with conveying unit along a conveying path having the heating unit equipped therewith, the thermal developing apparatus containing a manual feeding tray for manually feeding the exposed photosensitive thermal developing recording material into the thermal developing apparatus.

The present invention is formulation of aweto culture medium and oxygenating culture method of aweto. By means of high efficiency culture medium, deep culture of the liquid spawn and the oxygenating in the initial growth stage of sporophore, the present invention has high aweto sporophore producing efficiency and high yield. The culture medium for liquid spawn, which is obtained through spore or tissue separation and inoculated to culture medium solution, consists of glucose, peptone, yeast powder, potassium dihydrogen phosphate, magnesium sulfate, sodium chloride, vitamin B1 and water in certain weight proportion.

Disclosed is a method for forming a resist pattern, wherein the uniformity of development is improved by increasing the wettability of the surface of a resist layer when the resist pattern is formed on a device such as a photoresist. Specifically, a resist layer (93) is formed by applying a photosensitive resist over a substrate (91) (resist application step). Then, the resist layer (93) is partially irradiated with light (light exposure step). After that, a process gas for lyophilization is brought into contact with the resist layer (93) by being expelled through a discharge space (23) at near atmospheric pressure (atmospheric-pressure remote plasma lyophilization step). Then, a developer liquid (5) is brought into contact with the resist layer (93) (development step).

A system for recovering a fluid from a subterranean formation, including a production wellbore having a substantially horizontal production length extending through the formation, and a trench extending through the formation. A method of constructing a trench section in a subterranean formation, including providing within the formation an access wellbore having a substantially horizontal access wellbore length, introducing a trench cutting tool into the access wellbore, and advancing and retracting the trench cutting tool through the access wellbore in order to cut slots in the formation in a trench direction away from the access wellbore, repeatedly until a number of slots required to complete the trench section has been cut.

The invention concerns a nanowire structural element suited for use in a microreactor system or microcatalyzer system.A template based process is used for the production of the nanowire structural element, wherein the nanowires are electrochemically depositioned in the nanopores. The irradiation is carried out at different angles, such that a nanowire network is formed. The hollow chamber-like structure in the nanowire network is established through the dissolving of the template foil and removal of the dissolved template material. The interconnecting of the nanowires provides stability to the nanowire structural element and an electrical connection between the nanowires is created thereby.

The invention discloses easy-to-prepare PS plate developing liquid and a preparation method thereof, relating to the field of printing. The developing liquid comprises the components with contents as follows: 51-55g / L of potassium hydroxide, 155-175g / L of sodium silicate, 9-11g / L of sodium phosphate, 20-25g / L of sodium dodecyl benzene sulfonate and the balance being ion water or distilled water. The easy-to-prepare PS plate developing liquid has the advantages of high developing capability, high stability, long service life, easiness in clearing of residual alkaline liquid, uniform developing and the like; furthermore, the influence on no photosensitive coating caused by erosion is low, and a photosensitive layer of an image-text part cannot be eroded by the developing liquid.

A manufacturing method of an alkaline solution, comprising dissolving a gaseous molecule having oxidizing properties or reducing properties in an aqueous alkaline solution.

A barrier film material includes, in addition to an alkali-soluble polymer, a multivalent carboxylic acid compound having a plurality of carboxyl groups or a multivalent alcohol compound. Thus, the multivalent carboxylic acid compound or the multivalent alcohol compound is adhered onto the surface of a resist film, and hence, particles having been adhered to the surface of the resist film are removed in removing the barrier film. Also, in the case where the barrier film is removed simultaneously with development, the resist film can be prevented from remaining partly undissolved.

The invention relates to the technical field of semiconductor manufacturing and in particular relates to a burr-free photoetching method. The burr-free photoetching method comprises the following steps: S1, after pre-treating a wafer, coating the wafer with one layer of negative photoresist; carrying out selective exposure on the negative photoresist through a photoetching mask, wherein the exposure dosage of a photoetching machine is 100mj to 150mj and the focal distance deviation value is less than 1mu m; S2, carrying out first time of rotary covering and immersing type development on the exposed wafer, wherein the development time is 40s to 60s; S3, carrying out second time of rotary covering and immersing type development on the wafer after step S2, wherein the development time is 40sto 60s. According to properties of the negative photoresist, the negative photoresist can form a pattern better through limiting the exposure dosage, a exposure focal distance and time of 2 to 3 timesof the rotary covering and immersing type development, the pattern is wide in top and narrow in bottom and a lower layer of the pattern is concave inward; metal is not continuously distributed on thewhole photoresist in an evaporation process, so that a condition that the lower layer of the photoresist is stuck with the metal is avoided and a degummed metal layer is smooth and has no burrs; theelectrical property of appliances is improved and the yield of the appliances is improved.

An ink jet printing method includes the steps of: shooting an ink containing a color material in a penetrant by ink jet method to a surface of a print medium; and supplying only a penetrant containing no color material at a position on the print medium corresponding to a position at which the ink has been shot to diffuse the supplied penetrant in the print medium in order to control distribution of the color material supplied in the print medium as the ink is shot at the print medium.

A detachable developer in which a photosensitive unit and a development unit are separately and independently installed in a main body. The detachable developer includes a first axis connection member extending from one end portion of the photosensitive unit toward a rotation axis of a developing roller and having a first guide slot formed therein in which one end portion of the rotation axis of the developing roller is inserted, and a second axis connection member extending from the other end portion of the development unit toward a rotation axis at the other end portion of a photosensitive drum and having a second guide slot formed therein in which the other end portion of the rotation axis of the photosensitive drum is inserted. The first axis connection member and the second axis connection member extend parallel to each other.