Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Easy-to-prepare PS plate developing liquid and preparation method thereof

A developing solution and a simple technology, applied in the field of printing, can solve the problems of complex developing solution manufacturing and general developing effect, and achieve the effects of long service life, strong developing ability and small erosion effect.

Inactive Publication Date: 2015-01-14
ANHUI ZHONGCAI PRINTING
View PDF5 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The developing solution is the key to affect the developing effect. The developing solution currently on the market is complicated to manufacture and the developing effect is general, which cannot meet the demand of the printing industry for the developing solution. The market urgently needs a developing solution which is easy to manufacture and has a good developing effect to improve the printing quality. industry print quality

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0015] A developer solution for PS plates that is easy to manufacture. The components and contents in the developer solution are as follows: potassium hydroxide 53.2g / L, sodium silicate 160g / L, sodium phosphate 10g / L, sodium dodecylbenzenesulfonate 23g / L L, the rest is ionized water.

[0016] A preparation method for making easy PS plate developer, comprising the following steps:

[0017] 1) Stir 1 / 2 formula ratio potassium hydroxide, 1 / 2 formula ratio sodium silicate and 1 / 4 formula ratio ion water;

[0018] 2) Add 1 / 2 formula ratio ion water to the mixed solution in step 1), stir well, then add 1 / 2 formula ratio sodium phosphate, stir well;

[0019] 3) Add 1 / 4 formula ratio ion water to the mixed solution in step 2), stir evenly, then add 1 / 2 formula ratio potassium hydroxide, 1 / 2 formula ratio sodium silicate, stir evenly;

[0020] 4) Add 1 / 2 formula ratio sodium phosphate to the mixed solution in step 2), stir evenly, and then add formula ratio sodium dodecylbenzenesulfo...

Embodiment 2

[0022] A developer solution for PS plates that is easy to manufacture. The components and contents in the developer solution are as follows: potassium hydroxide 54g / L, sodium silicate 170g / L, sodium phosphate 9g / L, sodium dodecylbenzenesulfonate 20g / L , and the rest is distilled water.

[0023] A preparation method for making easy PS plate developer, comprising the following steps:

[0024] 1) Mix 1 / 2 formula ratio potassium hydroxide, 1 / 2 formula ratio sodium silicate and 1 / 4 formula ratio distilled water, and stir evenly;

[0025] 2) Add 1 / 2 formula ratio of distilled water to the mixed solution in step 1), stir evenly, then add 1 / 2 formula ratio sodium phosphate, and stir evenly;

[0026] 3) Add 1 / 4 formula ratio distilled water to the mixed solution in step 2), stir evenly, then add 1 / 2 formula ratio potassium hydroxide, 1 / 2 formula ratio sodium silicate, and stir evenly;

[0027] 4) Add 1 / 2 formula ratio sodium phosphate to the mixed solution in step 2), stir evenly, an...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses easy-to-prepare PS plate developing liquid and a preparation method thereof, relating to the field of printing. The developing liquid comprises the components with contents as follows: 51-55g / L of potassium hydroxide, 155-175g / L of sodium silicate, 9-11g / L of sodium phosphate, 20-25g / L of sodium dodecyl benzene sulfonate and the balance being ion water or distilled water. The easy-to-prepare PS plate developing liquid has the advantages of high developing capability, high stability, long service life, easiness in clearing of residual alkaline liquid, uniform developing and the like; furthermore, the influence on no photosensitive coating caused by erosion is low, and a photosensitive layer of an image-text part cannot be eroded by the developing liquid.

Description

technical field [0001] The invention relates to the field of printing, in particular to a PS plate developing solution which is easy to manufacture and a preparation method thereof. Background technique [0002] Development is an essential link in the printing industry, and it is also an important link that affects printing quality. Many people think that the development of PS plates is just to put the sun-dried PS plates in the developing pool and shake them for a few times, and then rinse them with water. Apply developing ink, remove dirt, and apply peach gum. There is no technology to talk about. The fact is that the development of the PS plate has technical requirements. It is a chemical reaction process that uses the property that the photosensitive layer that has not seen light is insoluble in dilute lye, while the photosensitive layer that has seen light is soluble in dilute lye. The developing solution is the key to affect the developing effect. The developing solut...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/32
Inventor 付云
Owner ANHUI ZHONGCAI PRINTING
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com