Supercharge Your Innovation With Domain-Expert AI Agents!

A steam atomizing film-pressing system

A membrane system, vapor pressure technology, applied in the direction of electrical components, printed circuit manufacturing, circuits, etc., can solve problems such as circuit breaks or gaps in the substrate, and achieve the effects of increasing coverage, strong practicability, and increasing yield

Inactive Publication Date: 2007-05-16
李澄文
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide an atomized vapor pressure film system, which solves the problems that the common film pressure system is easy to form circuit breaks or gaps in the substrate.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A steam atomizing film-pressing system
  • A steam atomizing film-pressing system
  • A steam atomizing film-pressing system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0012] As shown in accompanying drawings 4 and 5, the lamination process B of the present invention includes steam coating C and pressed dry film D. In the steam coating C, the substrate G is first placed on the transport roller H, and the transport roller H Driven to bring the substrate G to the steam coating device I, wherein the steam coating device I atomizes the steam moisture and coats the upper substrate G1 and the lower substrate G2 to complete the steam coating C, and finally enters the pressed dry film D , the substrate G enters the lamination entrance J, so that the substrate G presses the upper dry film J3 and the lower dry film J4 on the upper substrate G1 and the lower substrate G2 of the substrate G by the upper roller J1 and the lower roller J2, and the substrate G is completed. Lamination process B.

[0013] As shown in accompanying drawings 5 ​​to 9, when the substrate G is transported to the steam coating device I by the transport roller H on the lamination ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The related atomized steam squeezing film system belonged to chemical industry comprises: transferring the preheated substrate to the steam coating device to achieve required moisture; transferring the substrate to squeezing film inlet, and using upper and lower rollers to squeeze the upper and lower dry films on substrate. This invention coats water steam to prevent cut-off or notch led by chemical liquid drug erosion, and thereby improves product quality.

Description

technical field [0001] The invention relates to chemical machinery, in particular to an atomized steam pressure film system. Background technique [0002] As shown in Figures 1 to 3, the general lamination process A includes preheating the substrate A1 and pressing the dry film A2, and the circuit board A3 is placed on the conveying roller A5, and is conveyed to the pressing dry film A4 through the conveying roller A5 , when the dry film A4 is pressed on the circuit board A3, the bubbles of the dry film A4 itself and the cavities A7 of the substrate will form bubbles A6 or defects A8, making the circuit board A3 easy to etch from the chemical solution used when the dry film A4 is not completely covered The cavity A7 of the substrate is undercut and forms an open circuit or a gap, which needs to be improved. Contents of the invention [0003] The object of the present invention is to provide an atomized steam lamination system, which solves the problems of common laminatio...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H05K3/02G03F7/20G03F7/26
Inventor 李澄文
Owner 李澄文
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com