Process for high shear gas-liquid reactions

Abstract

A process for performing a chemical reaction between a plurality of chemical reactants in the presence of a catalyst, with at least a first reactant in a liquid phase and at least a second reactant in a gas phase, the first and second reactants mixing at least by interdiffusion. The process comprises supplying the reactants to a passage defined by a first surface and a second surface and optionally moving at least one of the first surface and second surface relative to each other. The reactants their mixture or reaction products form respective boundary layers against the first and second surfaces and the radial spacing between the first surface and second surface is equal to or less than the back-to-back radial thicknesses of the boundary layers.

Description

[0001] This application is a continuation-in-part of U.S. application Ser. No. 09 / 894,996, filed Jun. 27, 2001, which claims the benefit of the prior filing date of U.S. provisional patent application No. 60 / 214,538, filed Jun. 27, 2000, and also of U.S. application Ser. No. 10 / 661,170 filed Sep. 11, 2003, which claims the benefit of the prior filing date of U.S. provisional patent application No. 60 / 410,185, filed Sep. 11, 2002, herein incorporated by reference in their entirety.BACKGROUND OF THE DISCLOSURE [0002] 1. Field of the Disclosure [0003] The present disclosure relates to materials processing involving a chemical and / or a physical action(s) or reaction(s) of a component or between components. More specifically, the present disclosure produces a gas-in-liquid emulsion in a reactor to continuously process relatively large quantities of materials. [0004] 2. General Background and State of the Art [0005] Apparatus for materials processing consisting of coaxial cylinders that a...

AI Technical Summary

Benefits of technology

[0027] The method provides a superior, more economical and more efficient way of contacting gases with liq...

Problems solved by technology

However, this gas/liquid reaction method provides a relatively small gas/liquid contact area and is prone to considerable back-mixing (mixing in the longitudinal, axial or general flow direction) of the gas component thus providing an undesirably large residenc...

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