Burner and method for the manufacture of synthetic quartz glass

Inactive Publication Date: 2005-06-23
SHIN ETSU CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0017] An object of the invention is to provide a burner for use in the manufacture of synthetic quartz glass ingots which serve as the stock material from which synthetic quartz glass members having high optical homogeneity useful as optical parts such as lenses, prisms, windows and photomask-formin

Problems solved by technology

This is a serious problem when quartz glass is used as a transmissive material for ArF and KrF excimer lasers.
In addition to the essential unifor

Method used

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  • Burner and method for the manufacture of synthetic quartz glass
  • Burner and method for the manufacture of synthetic quartz glass
  • Burner and method for the manufacture of synthetic quartz glass

Examples

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Example

EXAMPLE

[0061] The following examples are provided to illustrate the invention, and are not intended to limit the scope thereof. It is noted that in Examples, an internal transmittance was measured by ultraviolet spectrophotometry (Cary 400 by Varian Corp.).

Example

Example and Comparative Example

[0062] A synthetic quartz glass ingot was produced by feeding methyltrimethoxysilane as the starting material to an inventive burner (FIG. 1) or a prior art burner (FIG. 3), effecting oxidative or combustion decomposition of the silane in an oxyhydrogen flame to form fine particles of silica, then depositing the silica particles on a rotating quartz target while melting and vitrifying them at the same time.

[0063] Specifically, as shown in FIG. 4, a quartz glass target 12 was mounted on a rotating heat-resistant support 11. Argon gas 15 was introduced into the methyltrimethoxysilane 14 held in a starting material vaporizer 13. Methyltrimethoxysilane 14 vapor was carried out of the vaporizer by the argon gas 15, and oxygen gas 16 was added to the silane-laden argon to form a gas mixture, which was then fed to the center tube of a main burner 17. As shown in FIGS. 1 and 3, the main burner 17 was also fed the following gases, in outward order from the fo...

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Abstract

A burner for use in the manufacture of synthetic quartz glass is provided, which comprises a main burner (7) comprising a multi-tube assembly (1) including a center tube (2) for feeding a silica-forming compound, a first enclosure tube (3) surrounding the center tube for feeding a combustion-supporting gas, and a second enclosure tube (4) surrounding the first enclosure tube for feeding a combustible gas; a tubular shell (5) surrounding the multi-tube assembly for feeding a combustible gas; and a plurality of nozzles (6) disposed within the tubular shell for feeding a combustion-supporting gas. A double-tube assembly (8) is disposed so as to surround the forward opening of the main burner (7) for feeding a combustion-supporting gas. Synthetic quartz glass ingots having high optical homogeneity are produced.

Description

CROSS-REFERENCE TO RELATED APPLICATION [0001] This non-provisional application claims priority under 35 U.S.C. §119(a) on Patent Application No. 2003-406982 filed in Japan on Dec. 5, 2003, the entire contents of which are hereby incorporated by reference. BACKGROUND OF THE INVENTION [0002] 1. Technical Field [0003] This invention relates to a burner for use in the manufacture of synthetic quartz glass ingots useful as the stock material for excimer laser synthetic quartz glass optical members and large-diameter synthetic quartz glass ingots useful as the stock material for liquid crystal-related large-size photomask substrates. More particularly, it relates to a burner for use in the manufacture of synthetic quartz glass ingots having optical-grade high homogeneity and a minimal change of light transmittance and useful as optical members such as lenses, prisms, mirrors, windows and photomask substrates in excimer laser systems, especially ArF excimer laser systems. The invention als...

Claims

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Application Information

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IPC IPC(8): C03B19/14C03B37/014F23D14/22F23D14/32
CPCC03B19/1423C03B2201/23C03B2207/06C03B2207/08C03B2207/12C03B2207/14Y02E20/344C03B2207/36C03B2207/40F23D14/22F23D14/32F23L2900/07002C03B2207/20
Inventor OTSUKA, HISATOSHISHIROTA, KAZUO
Owner SHIN ETSU CHEM CO LTD
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