Fabrication methods for electronic system modules
a technology of electronic system modules and fabrication methods, which is applied in the direction of resist details, sustainable manufacturing/processing, and final product manufacturing, etc., can solve the problems of not being able to support direct mounting of bumped devices at a pitch of 100 microns, and not being able to meet the requirements of conventional testing methods, etc., to achieve excellent dimensional stability, the effect of avoiding the use of epoxy under layers and reducing
Patent Information
- Authority / Receiving Office
- US · United States
- Patent Type
- Applications(United States)
- Current Assignee / Owner
- Publication Date
- 2005-06-30
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
RELATED APPLICATIONS
[0001] This application claims priority to Provisional Application Ser. No. 60 / 318,271 filed Sep. 7, 2001.BACKGROUND OF THE INVENTION
[0002] 1. Field of the Invention
[0003] This invention relates generally to an electronic system module and method of fabrication, and more particularly to an electronic system module fabricated on a carrier from which it can be released.
[0004] 2. Description of the Related Art
[0005] The number of input / output (I / O) connections required by integrated circuit (IC) chips is increasing, to several hundred for recent microprocessor chips. As verification of complex designs becomes an increasing portion of the total design activity, it is desirable to increase the I / O count further, to provide access to more internal nodes for testing. Flip chip assembly methods have helped to provide more I / O connections because they provide an area array of connections across the entire face of an IC chip, rather than just at the perimeter as with ...
Examples
Embodiment Construction
[0054]FIG. 1A shows a corner fragment of a glass carrier 1. Photo resist has been patterned on the carrier, so that a border of resist, 2, having a width of approximately 20 mm, surrounds the perimeter. FIG. 1B shows that a film of release layer, 3, has been applied over the entire surface of the glass carrier. A suitable material for the release layer is a fluorinated silicone such as F065 manufactured by Gelest, Inc., in Morrisville Pa., USA. This material is a single part gel. It can be applied as a fog or fine spray, or using the spin-on method. A suitable thickness is 2-5 microns after curing, with 2 microns preferred. A typical curing cycle is 125° C. for 25 minutes. This release material has a silane component that bonds well to glass surfaces, yet presents a fluid-like interface to polymeric materials like the base layer to be subsequently applied. FIG. 1C shows the result of lifting the resist to pattern the release layer, using a developer or resist stripper to swell the r...