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Apparatus and method of fabricating thin film pattern

Inactive Publication Date: 2007-12-27
LG DISPLAY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Benefits of technology

[0023]Accordingly, it is an object of the invention to provide a fabricating method and apparatus of a thin film pattern that improves the reliability of forming a thin film pattern by a resist printing method by way of improving a transfer characteristic of an etch resist solution.

Problems solved by technology

However, the photolithography process includes a number of processes such as an exposure process, a development process, a cleaning process, an inspection process, etc, thereby causing an increase of the manufacturing cost of the liquid crystal display panel.
If a silicon-based surfactant is used, the coating can be good but the silicon-based material contaminates the blanket.

Method used

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  • Apparatus and method of fabricating thin film pattern
  • Apparatus and method of fabricating thin film pattern
  • Apparatus and method of fabricating thin film pattern

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Embodiment Construction

[0041]Reference will now be made in detail to the preferred embodiments of the invention, examples of which are illustrated in the accompanying drawings.

[0042]With reference to FIGS. 3 to 5, embodiments of the invention will be explained as follows.

[0043]A fabricating method and apparatus of a thin film pattern according to one preferred embodiment of the invention uses an etch resist solution that includes a surfactant inclusive of an ethylene oxide fluorinated polymer. The etch resist solution including this surfactant has a stronger adhesive force with the print plate than with the blanket, thus it becomes possible to easily transfer the etch resist solution from the blanket to the print plate. As a result, the reliability of forming the thin film pattern by a resist printing method can be improved.

[0044]Referring to FIGS. 2A to 2D, the etch resist solution of the invention will be explained in detail in conjunction with a fabricating method of a thin film pattern by a resist pri...

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Abstract

A fabricating method and apparatus of a thin film pattern improves the reliability of forming the thin film pattern by a resist printing method. The apparatus includes a print roller device of a roll shape around which a blanket is wound; a spray device located around the print roller device for spraying an etch resist solution to the blanket; and a print plate of an engraved shape where a groove of a desired thin film shape and a projected part except the groove are formed, and the etch resist solution has a surfactant inclusive of an ethylene oxide fluorinated polymer material.

Description

[0001]This application claims the priority benefit Under 35 U.S.C. §119 of the Korean Patent Application No. P06-0056739 filed on Jun. 23, 2006, which is hereby incorporated by reference.BACKGROUND OF THE INVENTION[0002]1. Field of the Invention[0003]The invention pertains to a fabricating method of a thin film pattern of a display panel, and more particularly to a reverse resist printing device and a fabricating method of a thin film pattern using the same.[0004]2. Description of the Related Art[0005]Recently, various flat panel display devices, which can reduce the weight and size that are a disadvantage of a cathode ray tube, have been on the rise. The flat panel display devices includes liquid crystal displays, field emission displays, plasma display panels, organic electro luminescence (hereinafter, referred to as ‘EL’) displays, etc.[0006]Among these, the liquid crystal display devices control the light transmittance of liquid crystal by using an electric field, thereby displa...

Claims

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Application Information

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IPC IPC(8): C03C25/68B05C1/00
CPCG02F1/1333G02F2202/022G02F2202/28H01J2209/02H01L21/0212H01L27/1292H01L21/3127H01L21/6715H01L51/56H01L27/124H01L21/02288G02F1/13G02F1/136H10K71/00
Inventor KIM, JIN WUK
Owner LG DISPLAY CO LTD
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