Substrate holder, substrate supporting apparatus, substrate processing apparatus, and substrate processing method using the same
Patent Information
- Authority / Receiving Office
- US · United States
- Current Assignee / Owner
- CHARM ENG CO LTD
- Publication Date
- 2011-03-03
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
TECHNICAL FIELD
[0001] The present disclosure relates to a substrate holder, a substrate supporting apparatus, a substrate processing apparatus, and a substrate processing method, and more particularly, to a substrate holder, a substrate supporting apparatus, a substrate processing apparatus, and a substrate processing method that are adapted to improve process efficiency and etch uniformity at the back surface of a substrate.BACKGROUND ART
[0002] Generally, semiconductor apparatuses and flat display apparatuses are manufactured by depositing a plurality of thin layers on the front surface of a substrate and etching the thin layers to form devices having predetermined patterns on the substrate. That is, a thin layer is deposited on the front surface of a substrate by using a deposition apparatus, and then portions of the thin layer are etched into a predetermined pattern by using an etching apparatus.
[0003] Particularly, since such thin layer deposition and etch processes are performed o...