Lithographic Apparatus and Device Manufacturing Method

Abstract

Data from the piezo-electric sensors in the mounts for the projection system can be used in the control loops for other parts of the lithographic apparatus, for example the mask table, the substrate table or the air mounts for the frame bearing the projection system. Information from, for example, a geophone, which is used to measure the absolute velocity of the frame bearing the projection system, can be used in the control loop for the piezo-electric actuator in the mount for the projection system.

Description

CROSS REFERENCE TO RELATED APPLICATIONS[0001]This application is a Divisional of pending U.S. patent application Ser. No. 11 / 430,181; filed May 9, 2006, which is incorporated by reference herein in its entirety.BACKGROUND[0002]1. Field of the Invention[0003]The present invention relates to a lithographic apparatus and a method for manufacturing a device.[0004]2. Background Art[0005]A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). In that instance, a patterning device, which is alternatively referred to as a mask or a reticle, may be used to generate a circuit pattern to be formed on an individual layer of the IC. This pattern can be transferred onto a target portion (e.g. including part of, one, or several dies) on a substrate (e.g. a silicon wafer). Transfer of the pattern is typically via imaging o...

AI Technical Summary

Benefits of technology

[0007]It is desirable to reduce alignment errors resulting from the misalignment of the PL and other parts of the lithographic apparatus.

[0011]According to an embodiment of the invention, there is provided a lithographic apparatus including a projection system configured to project a patterned beam onto a target portion of a substrate, a frame constructed to hold the projection system, a mount constructed to support the projection system on the frame, the mount including a piezo-electric sensor constructed to detect the force applied to the projection system, a second mount constructed to support the frame and minimize vibration of the frame, wherein the vibration of the frame is minimized by controlling the second mount based on the detected force.

[0012]According to an embodiment of the invention, there is provided a device manufacturing method including projecting a patterned beam of radiation onto a target portion of the substrate using a projection system, holding the projection system using a frame, supporting the projection system on the frame using a mount, the mount including a piezo-electric sensor for detecting the force applied to the projection system, supporting the frame and minimizing vibrations of the frame using a second mount, and controlling the second mount to minimize the vibration of the frame based on the detected force.

Problems solved by technology

However, if the frame supporting the projection system and / or the substrate table and / or the support for the patterning device move or vibrate while the projection system remains stationary alignment errors could result.

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