Organic electroluminescence display device and manufacturing method therefor
Inactive Publication Date: 2012-02-23
CANON KK
0 Cites 3 Cited by
AI-Extracted Technical Summary
Problems solved by technology
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreMethod used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreBenefits of technology
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreAbstract
Provided is an organic eletroluminescence display device, which is capable of preventing transfer of an attached matter from the vapor deposition mask to the insulating layer, without increasing steps or manufacturing cost. The organic eletroluminescence display device includes: a first insulating layer formed on a substrate; multiple first electrodes disposed on the first insulating layer; an opening formed in the first insulating layer at a periphery of the first electrode; a second insulating layer disposed in a region overlapping with the opening; an organic compound layer covering the first electrodes; and a second electrode formed on the organic compound layer, in which: a material forming the first electrodes is absent in the opening; and the second insulating layer has a recess formed in a surface thereof, reflecting the opening of the first insulating layer, the recess being formed in a vertical direction of the substrate surface.
Application Domain
Technology Topic
Image
Examples
- Experimental program(3)
Example
Example
Example
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more PUM


Description & Claims & Application Information
We can also present the details of the Description, Claims and Application information to help users get a comprehensive understanding of the technical details of the patent, such as background art, summary of invention, brief description of drawings, description of embodiments, and other original content. On the other hand, users can also determine the specific scope of protection of the technology through the list of claims; as well as understand the changes in the life cycle of the technology with the presentation of the patent timeline. Login to view more.
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more Similar technology patents
Ablation catheter with grooves in surface
ActiveCN103505798AReduce contact areaReduce frictional resistanceCatheterSurgical ManipulationGuiding catheter
Owner:SHANGHAI GOLDEN LEAF MED TEC
Apparatus for wire rope inspection, and apparatus and method for wire rope damage determination
Owner:TOKYO ROPE MFG
Silicon crystal growing device with two-way airflow
InactiveCN101713095AReduce corrosionReduce contact areaBy pulling from meltUnder a protective fluidCartridge heaterCorrosion
Owner:芜湖升阳光电科技有限公司
Surface cleaning device for solar cell panel production
InactiveCN108899396AReduce contact areaReduce stickingFinal product manufactureSemiconductor/solid-state device manufacturingCharge and dischargeSolar cell
Owner:杨岩
Fabricated building beam column steel structure connecting component
ActiveCN111648472AReduce contact areaPrecise alignmentBuilding constructionsEngineeringClassical mechanics
Owner:YANGZHOU LIDUO STEEL STRUCTURE ENG
Classification and recommendation of technical efficacy words
- Reduce contact area
Wafer-Supporting Device and Method for Producing Same
ActiveUS20130014896A1Improve uniformity of film thickness and film propertyReduce contact areaSemiconductor/solid-state device manufacturingSpecial surfacesEngineeringSemiconductor
Owner:ASM JAPAN
Phase change memory device having a reduced contact area and method for manufacturing the same
InactiveUS20100163820A1Reduce contact areaSolid-state devicesSemiconductor/solid-state device manufacturingEngineeringPhase-change memory
Owner:SK HYNIX INC
Semiconductor device and method for fabricating the same
InactiveUS20070096212A1Interconnection resistance increaseReduce contact areaSolid-state devicesSemiconductor/solid-state device manufacturingPhysicsImpurity diffusion
Owner:PANASONIC CORP
Mechanical clamping equipment with magnetorheological fluid damping effect
InactiveCN107081621AReduce contact areaReduce frictionVibration dampersPositioning apparatusMechanical engineeringMagnetorheological fluid
Owner:LIANYUNGANG NORMAL COLLEGE