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Ultrasonic cleaning device

a cleaning device and ultrasonic technology, applied in the direction of cleaning process and equipment, cleaning objects to be cleaned, cleaning using liquids, etc., can solve the problems of difficulty in coping with an increase in the diameter of the cleaning surface of an object to be cleaned, the ultrasonic energy hitting the receiving portion, and the object cannot be reached

Inactive Publication Date: 2013-05-23
KAIJOO KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The ultrasonic cleaning device described in this patent allows for the cleaning of objects by using a cleaning liquid and ultrasonic energy. The device includes an ultrasonic transducer that provides ultrasonic energy to the cleaning liquid as it flows through the device. The cleaning liquid is then discharged from the device onto the surface of the object to be cleaned, allowing it to clean the surface using both the liquid and the ultrasonic energy. The device can be used in a tank where the object is immersed in the cleaning liquid, further improving the cleaning effect.

Problems solved by technology

As described above, with the prior-art probe (solid rod)-type ultrasonic cleaning device for single-wafer spin cleaning and the prior-art ultrasonic cleaning device for cleaning large substrates, it is difficult to cope with an increase in diameter of a cleaning surface of an object to be cleaned.
Thus, there is a problem that the ultrasonic energy hits the receiving portion 116a in bottom part of the carrier 116 and does not reach the object to be cleaned.

Method used

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Examples

Experimental program
Comparison scheme
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embodiment 1

[0171

[0172]FIG. 1 is a sectional view illustrating an ultrasonic cleaning device according to an embodiment 1 of the present invention. FIGS. 2 and 3 are sectional views enlarging a part of an ultrasonic propagation tube 12 and an object to be cleaned 21 shown in FIG. 1.

[0173]The ultrasonic cleaning device shown in FIG. 1 has a case (housing) 11, and the ultrasonic propagation tube 12 is mounted at a distal end portion of the case (housing) 11. A material of this ultrasonic propagation tube 12 is an inactive non-contaminant such as quartz, which can easily prevent contamination from a liquid contact portion. Since a solution containing hydrofluoric acid has an action to etch quartz, if a solution containing hydrofluoric acid is to be used as a cleaning liquid, sapphire, silicon carbide or high purity aluminum (Al2O3) may be used or quartz coated with a substance resistant against the hydrofluoric acid solution such as silicon carbide, high purity aluminum (Al2O3), PFA of fluorine re...

embodiment 2

[0231

[0232]FIG. 6(A) is a sectional view illustrating an ultrasonic propagation tube of an ultrasonic cleaning device according to an embodiment 2 of the present invention, FIG. 6(B) is a view of the ultrasonic propagation tube shown in FIG. 6(A) seen from below, and FIG. 6(C) is a sectional view illustrating a state in which the ultrasonic propagation tube shown in FIGS. 6(A) and 6(B) is arranged on the object to be cleaned 21.

[0233]In the ultrasonic cleaning device of the embodiment 1 shown in FIG. 1, the propagation liquid 15 and the cleaning liquid 19 are configured to be separated from each other, but in the ultrasonic cleaning device of the embodiment 2, the cleaning liquid is used as the propagation liquid, and the propagation liquid and the cleaning liquid are configured to be made common. That is, in the ultrasonic cleaning device according to the embodiment 2, the ultrasonic propagation tube 12 of the ultrasonic cleaning device shown in FIG. 1 is replaced by an ultrasonic ...

embodiment 3

[0262

[0263]FIG. 16(A) is a sectional view illustrating an immersion-type ultrasonic cleaning device according to an embodiment 3 of the present invention, and FIG. 16(B) is a sectional view obtained by cutting the ultrasonic cleaning device in a direction perpendicular to the section shown in FIG. 16(A).

[0264]This ultrasonic cleaning device has a cleaning tank 56 filled with a cleaning liquid 57 and is a device in which the cleaning tank 56 is filled with the cleaning liquid 57 and a carrier (transporting unit) 58 holding a plurality of semiconductor wafers 59 as objects to be cleaned is immersed for cleaning in the cleaning liquid 57 in the cleaning tank 56.

[0265]In the cleaning tank 56, the two ultrasonic propagation tubes 37 shown in FIGS. 6(A) and 6(B) are inserted and mounted. The ultrasonic propagation tube 40 shown in FIGS. 7(A) and 7(B) may be used in this embodiment. At a distal end (front end portion) of the ultrasonic propagation tube 37, the attenuator 47a for absorbing ...

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Abstract

An ultrasonic cleaning device including an ultrasonic transducer (13) for providing ultrasonic energy to a propagation liquid (15), an ultrasonic propagation tube (12) for flowing the propagation liquid provided with the ultrasonic energy by the ultrasonic transducer, a holding mechanism disposed below the ultrasonic propagation tube for holding an object to be cleaned (21), and a cleaning liquid supply mechanism for supplying a cleaning liquid to a cleaning surface of the object to be cleaned held by the holding mechanism, and the ultrasonic propagation tube (12) is disposed so that a side surface thereof may contact a liquid film (19) of the cleaning liquid formed on the cleaning surface by supplying the cleaning liquid to the cleaning surface by the cleaning liquid supply mechanism.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]The present application claims priority from Japanese Patent Application No. 2008-211977, filed Aug. 20, 2008, the contents of which are herein incorporated by reference in their entirety.TECHNICAL FIELD[0002]The present invention relates to an ultrasonic cleaning device by single-wafer spin cleaning, an immersion type ultrasonic cleaning device, and an ultrasonic cleaning device for cleaning a large substrate.BACKGROUND ART<Single-Wafer Spin Cleaning>[0003]FIG. 24 is a sectional view illustrating a prior art spot-shower type ultrasonic cleaning device for single-wafer spin cleaning. This ultrasonic cleaning device is the one for cleaning an object to be cleaned 101 having a flat plane such as a semiconductor wafer. This device has a mechanism (not shown) for spinning the object to be cleaned 101 in order to clean the entire surface of the object to be cleaned 101, an ultrasonic transducer 103 for providing ultrasonic energy to a cl...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): B08B3/12
CPCH01L21/67051H01L21/67057Y10S134/902H01L21/67017B08B3/12
Inventor SUZUKI, KAZUNARIHAN, KI
Owner KAIJOO KK