Plasma Spray Method

a technology of plasma and spraying, applied in chemical vapor deposition coating, inorganic chemistry, metallic material coating process, etc., can solve the problems of high cost, inability or only possible, unsuitable precursors, etc., and achieve the effect of reducing the conveying ra

US20130224393A1Inactive Publication Date: 2013-08-29SULZER METRO AG +1
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Patent Information

Authority / Receiving Office
US · United States
Patent Type
Applications(United States)
Current Assignee / Owner
Publication Date
2013-08-29
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention relates to a plasma spray method which can serve as a starting point for a manufacture of metal nanopowder, nitride nanopowder or carbide nanopowder or metal films, nitride films or carbide films. To achieve an inexpensive manufacture of the nanopowder or of the film, in the plasma spray in accordance with the invention a starting material (P) which contains a metal or silicon oxide is introduced into a plasma jet (113) at a process pressure of at most 1000 Pa, in particular at most 400 Pa. The starting material (P) contains a metal or silicon oxide which vaporizes in the plasma jet (113) and is reduced in so doing. After the reduction, the metal or silicon which formed the metal or silicon oxide in the starting material is thus present in pure form or in almost pure form. The metal or silicon can be deposited in the form of nanopowder or of a film (124). Nitride nanoparticles or films or carbide nanoparticles or films can be generated inexpensively by addition of a reactant (R) containing nitrogen or carbon.
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Description

CROSS-REFERENCE TO RELATED APPLICATIONS

[0001] The present application claims priority under 35 U.S.C. §119 of European Patent Application No. 12156660.8 filed on Feb. 23, 2012, the disclosure of which is expressly incorporated by reference herein in its entirety.STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT

[0002] Not applicable.REFERENCE TO A COMPACT DISK APPENDIX

[0003] Not applicable.BACKGROUND OF THE INVENTION

[0004] It is known that nitride nanopowder or carbide nanopowder can be manufactured using suitable liquid or gaseous starting materials, so-called precursors. In this connection, a nanopowder should be understood as a powder having a grain size of approximately 1 nm to 1 μm. Suitable precursors, for example titanium tetrachloride or tetrakis (dimethylamino) titanium, are very expensive and usually very toxic or dangerous. The precursors are vaporized for manufacturing the nanopowder and form nanopowder in a reactive chemical gas phase deposition process (a so-c...

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Embodiment Construction

[0029]In accordance with FIG. 1, a plasma spray apparatus 11 suitable for carrying out a method in accordance with the invention has a plasma generator 12 known per se and having a plasma torch, not shown in more detail, for producing a plasma. A process jet 13 is generated in a manner known per se from a starting material P, a process gas mixture G and electrical energy E using the plasma generator 12. The feeding of these components E, G and P is symbolized by the arrows 14, 15, 16 in FIG. 1. The generated plasma jet 13 exits the plasma generator through an outlet nozzle 17 and transports the starting material P in the form of the plasma jet 13 in which material particles 18 are dispersed in a plasma. This transport is symbolized by an arrow 19.

[0030]The process gas G for the production of the plasma is preferably a mixture of inert gases, in particular a mixture of argon, hydrogen and helium.

[0031]The plasma spray apparatus 11 is arranged in a process chamber 20 in which a define...