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Temperature control system

a temperature control and temperature technology, applied in the field of temperature control systems, can solve the problems of unstable control and unstable amount of generated vapor, and achieve the effects of avoiding complex structure and enlargement of equipment, high accuracy and precision, and uniform temperature in the refrigerant drum

Inactive Publication Date: 2014-06-12
JAPAN PETROLEUM EXPLORATION CO LTD +5
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The temperature control system in this patent text uses a replenishing line to supply makeup water to a refrigerant drum in a reactor. makeup water is combined with a mixture of vapor and liquid refrigerant to heat it to saturation temperature before being supplied to the refrigerant drum. This ensures that the gas-liquid temperature in the refrigerant drum remains constant. Compared to conventional systems where makeup water is directly supplied to the refrigerant drum, this system avoids the complexity and cost of excessive equipment. The control unit accurately calculates the amount of makeup water needed based on the reaction heat in the reactor and physical values of the refrigerant. This prevents the formation of slugs in the system and ensures high accuracy and precision in the temperature control of the reactor.

Problems solved by technology

Hence, if this configuration is applied to temperature control of an FT (Fisher-Tropsch) reactor, control becomes unstable.
Moreover, there is another problem in that the amount of generated vapor becomes unstable because the temperature of the liquid phase decreases due to the amount of water supplied to the steam drum.

Method used

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example

[0094]Next is a description of an example of the temperature control system 1 according to an embodiment of the present invention.

[0095]First, in FIG. 2, it is assumed that the temperature inside the steam drum 2, the respective water temperatures t1 of the water to be supplied at the flow rates WL4 and WL2 via the supply line 3, and the temperature t1 of vapor at the flow rates WV1 and WV2 are all a saturation temperature of 195° C. It is also assumed that the water temperature t3 of the makeup water in the amount of WL3 is 110° C.

[0096]Moreover, it is assumed that

[0097]reaction heat Q=8000000 kcal / h

[0098]evaporative latent heat of water r=470 kcal / kg (physical property (constant))

[0099]specific heat Cp of water=1 kcal / kg / ° C. (physical property (constant))

[0100]pressure in steam drum=1.3 MPaG

[0101]circulation amount WL4 of water supply pump 4=68000 kg / h.

[0102]Under the above conditions, the control unit 25 of the temperature control system 1 determines the amount of makeup water W...

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Abstract

A temperature control system of the invention recovers reaction heat in a reactor in which an exothermal reaction occurs, to control the temperature in the reactor. The temperature control system includes: a refrigerant drum in which vapor and a liquid refrigerant are stored in a vapor-liquid equilibrium state; a heat removing section arranged in the reactor to evaporate a part of the liquid refrigerant supplied from the refrigerant drum by the reaction heat; a Return line that returns mixed phase fluid of vapor and the liquid refrigerant generated in the heat removing section to the refrigerant drum; a Vapor outlet line that supplies vapor in the refrigerant drum to outside of the system; and a Replenishing line that supplies makeup water in an amount matched with an amount of vapor discharged to the outside of the system, to the Return line.

Description

CROSS-REFERENCE TO RELATED APPLICATION[0001]This application is a Section 371 of International Application No. PCT / JP2012 / 069692, filed Aug. 2, 2012, which was published in the Japanese language on Feb. 14, 2013, under International Publication No. WO 2013 / 021908 A1, and the disclosure of which is incorporated herein by reference.TECHNICAL FIELD[0002]The present invention relates to a temperature control system that can perform precise temperature control of a reactor by making the temperature in a refrigerant drum such as a steam drum uniform.[0003]Priority is claimed on Japanese Patent Application No. 2011-171812, filed Aug. 5, 2011, the content of which is incorporated herein by reference.BACKGROUND ART[0004]Conventionally, as a water supply system for a steam drum, there are those described for example in Patent Documents 1 and 2. The water supply system described in Patent Document 1 supplies water to a drum via a water supply line from an economizer upon reception of flue gas,...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): F25D7/00F28B9/04F28B11/00F25D1/02F28B9/02
CPCF25D7/00F25D1/02F28B9/04F28B9/02F28B11/00F22B35/00B01J8/22B01J8/001B01J2208/00061B01J2208/00115B01J2219/002B01J2219/00211B01J2219/00238C10G2/32
Inventor KATO, YUZURUYAMADA, EIICHIMORITA, KENTAROU
Owner JAPAN PETROLEUM EXPLORATION CO LTD
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