Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Device with quantum well layer

a quantum well and layer technology, applied in the direction of radiation controlled devices, optical radiation measurement, instruments, etc., can solve the problems of difficult manufacturing of devices with materials of different compositions in the absorbing means and the waveguide, and achieve the effects of reducing losses, reducing absorption in the waveguide, and reducing the band gap of the absorbing layer

Inactive Publication Date: 2015-01-29
ASTRIUM GMBH
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The patent describes a device that absorbs electromagnetic radiation using a quantum well layer. The quantum well layer is present in both the absorbing means and the waveguide, allowing for better control over the absorption and band gap. The device can be made with materials of different compositions in the absorbing means and the waveguide, but the quantum well layer is also present in the resonators. This allows for more precise control over the absorption in the waveguide, while optimizing the quantum well layer to minimize loss of resonance. The device can be made with a minimum level of absorption in the waveguide, and the quantum well layer is configured to provide the desired ground state transition energy and maximize the quality factor of resonance, keeping the strain within the quantum-well layer lower than a maximum acceptable limit. The thickness and composition of the quantum well layer are determined to provide the desired ground state transition energy and maximize the quality factor of resonance. Overall, the invention provides better control over the absorption and band gap of the device, which can enhance its performance and reliability.

Problems solved by technology

However, it is difficult to manufacture devices with materials of different compositions in the absorbing means and the waveguide.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Device with quantum well layer
  • Device with quantum well layer
  • Device with quantum well layer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025]Referring now to FIG. 1, a spectrometer-on-a-chip is illustrated according to an embodiment of the present invention. The spectrometer 100 comprises a substrate 110, elongate waveguide120, and a plurality of disk resonators 130 coupled to the waveguide 120. The waveguide 120 may be a ridge waveguide. Each disk resonator 130 is provided with an electrode 140 for sensing a current in the disk resonator, the electrode 140 being connected to a bond pad 150 for connecting the spectrometer 100 to other components. One of the disk resonators 130 is shown in plan view in FIG. 2, and FIG. 3 shows a cross-section along the line III-III of FIG. 2. FIG. 4 illustrates in detail the structure of the active layer shown in FIG. 3. The drawings are schematic, and provided for illustrative purposes only. In particular, other layers and components may be present, but have been omitted in the drawings for clarity. For instance, additional layers of metallisation may be deposited above and below t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A device for guiding and absorbing electromagnetic radiation, the device including: absorbing means for absorbing the electromagnetic radiation; and a coupled to the absorbing means for guiding the electromagnetic radiation to the absorbing means, wherein the waveguide and the absorbing means are formed from a structure including a first cladding layer, a second cladding layer over the first cladding layer, and a quantum-well layer between the first and second cladding layers, the quantum-well layer being formed of a material having a different composition to the first and second cladding layers, wherein the thickness and the composition of the quantum-well layer is optimised to provide an acceptable level of absorption of electromagnetic radiation in the waveguide while providing an appropriate band gap for absorption of the electromagnetic radiation in the absorbing means.

Description

FIELD OF THE INVENTION[0001]The present invention relates to a device for guiding and absorbing electromagnetic radiation. In particular, the invention relates to a structure comprising a quantum-well layer.BACKGROUND OF THE INVENTION[0002]Spectrometers are used in many applications for measuring properties of light across a range of wavelengths. For example, a spectrometer can be used for compositional analysis, by obtaining absorption or emission spectra for an object of interest. The presence and location of peaks within the spectra can indicate the presence of particular elements or compounds. Spectrometers are commonly used for analysis at optical wavelengths, but can also be used at other wavelengths such as microwave and radio wavelengths.[0003]Spectrometers are typically relatively complex and expensive devices that require the alignment of a number of moving parts to be controlled with high precision. For example, a typical spectrometer may focus light onto a diffraction gr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L31/0352H01L31/0232H01L27/144G06F17/50
CPCH01L31/035236H01L27/1446H01L31/02325G06F17/5045G02B6/29341G01J3/0205G01J3/42G01J3/0259G02F1/01708B82Y20/00G02F1/0155G06F30/30
Inventor SWEENEY, STEPHENZHANG, YAPING
Owner ASTRIUM GMBH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products