Method for producing antireflection film, antireflection film, and coating composition

a technology of antireflection film and coating composition, which is applied in the direction of synthetic resin layered products, instruments, transportation and packaging, etc., can solve the problems of difficult control of drying step after drying, low production efficiency, and no degree of freedom in the choice of coating solvents, etc., to achieve low reflectance, improve production efficiency, and simplify production steps

Active Publication Date: 2016-06-30
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The present invention provides a coating composition that can form a multilayer structure in a single coating step, resulting in an antireflection film with improved production efficiency, adhesion properties, scratch resistance, and reflectance. The coating composition includes a fluorine-containing polymer that lowers the surface energy of inorganic fine particles, allowing them to be distributed unevenly in the coating film. This reduces the likelihood of aggregation and unintended reactions with the coating composition. Additionally, by using a curable binder that separates from the fluorine-containing polymer, a layer with and without inorganic fine particles can be formed, resulting in a final multilayer structure with excellent properties.

Problems solved by technology

However, such a technology is excellent in that an antireflection film can be produced in a small number of coating steps, but is poor in that there is no degree of freedom in choice of a coating solvent, it is difficult to control a drying step after coating, and it is also difficult to obtain an antireflection film having a high antireflection function, by precisely controlling a film thickness due to variation in conditions and irregularity in drying.
With the methods of JP2007-238897A and JP2009-198748A, in order to segregate inorganic fine particles in the upper part of a coating film, the inorganic fine particles are surface-treated with a fluorine-containing compound, but it is not easy to control the reaction conditions of the treatment because the treatment is carried out using the compound that forms covalent bonds with the surface of the inorganic fine particles.
As a result, aggregation of the inorganic fine particles during the treatment and progress of unintended reactions of the unreacted compounds in the coating composition easily occur.

Method used

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  • Method for producing antireflection film, antireflection film, and coating composition
  • Method for producing antireflection film, antireflection film, and coating composition
  • Method for producing antireflection film, antireflection film, and coating composition

Examples

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Effect test

example 1

[0413](Fabrication of Undercoat Layer-Adhered Base Material)

[0414][Preparation of Coating Liquid (Sub-1) for Undercoat Layer]

[0415]The respective components were mixed in the composition shown in Table 3 below, the solid content concentration was adjusted to 40% by mass with a solvent of MEK (methyl ethyl ketone) / MIBK (methyl isobutyl ketone) / cyclohexanone=45 / 45 / 10 (mass ratio), and the mixture was filtered through a filter made from polypropylene having a pore size of 30 μm to prepare a coating liquid for an undercoat layer.

TABLE 3Coating Liquid Sub-1BinderDPCA - 20 / 40 parts by massPolymerizationIRGACURE 184 / 2 parts by massinitiatorSilica solMIBK - ST / 10 parts by mass (in terms of solid content)

[0416]The compounds used above are shown below:[0417]DPCA-20: Partially caprolactone-modified polyfunctional acrylate (manufactured by Nippon Kayaku Co., Ltd.)[0418]Silica sol: MIBK-ST, dispersion at a solid content concentration of 30% with an MIBK solvent, silica fine particles having an a...

example 2

[0484][Preparation of Hollow Silica Particle Dispersion S-5]

[0485]γ-Acryloyloxypropyl trimethoxysilane (a molecular weight as defined herein of 192) (20 parts by mass), 1.51 parts by mass of diisopropoxyaluminum ethyl acetate, and 500 parts by mass of methyl ethyl ketone were added to 500 parts by mass of a hollow silica fine particle sol A (isopropyl alcohol silica sol, average particle diameter 45 nm, silica concentration 20%, and silica particle refractive index 1.30), mixed, and then 3 parts by mass of ion exchange water was added thereto. This mixed liquid was reacted at 60° C. for 4 hours, and then cooled to room temperature, and 1.8 parts by mass of acetylacetone was added thereto to obtain a dispersion. Thereafter, while adding cyclohexanone thereto so as to maintain the content of silica to be substantially constant, solvent replacement was carried out by distillation under reduced pressure at a pressure of 30 Torr, and finally, the concentration was adjusted to obtain a ho...

example 3

[0497](Production of (Meth)Acrylic Resin Film)

[0498]A pellet [a mixture of 90 parts by mass of a (meth)acryl-based resin having a lactone ring structure in which R1 is a hydrogen atom and R2 and R3 are methyl groups in the following general formula (1A) {copolymerization monomer mass ratio=methyl methacrylate / 2-(hydroxymethyl)methyl acrylate=8 / 2, lactone ring formation rate: about 100%, content ratio of the lactone ring structure: 19.4%, weight average molecular weight: 133,000, melt flow rate: 6.5 g / 10 min (240° C., 10 kgf), Tg 131° C.} and 10 parts by mass of an acrylonitrile-styrene (AS) resin {Toyo-AS AS 20, manufactured by Toyo Styrene Co., Ltd. }; Tg 127° C.] was supplied to a biaxial extruder and melt-extruded in a sheet shape at about 280° C. to obtain a (meth)acryl-based resin sheet having a lactone ring structure with a thickness of 110 μm. The unstretched sheet was stretched longitudinally by 2.0 times and laterally by 2.4 times under a temperature condition of 160° C. to...

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Abstract

The method for producing an antireflection film is provided. The method includes, a step of coating a coating composition including the following components (A) to (D) on a base material to form a coating film, a step of volatilizing the solvent from the coating film for drying the coating film, and a step of curing the coating film to form a cured layer, in which a multilayer structure having different refractive indices from the coating composition is formed: (A) a fluorine-containing polymer with a specific structure, having a polyalkylene oxide group in the molecule, (B) non-surface-modified inorganic fine particles, or inorganic fine particles that are surface-treated with a silane coupling agent having a molecular weight of 600 or less, (C) a curable binder having no fluorine atom in the molecule, and (D) a solvent, provided that the mass ratio of [component (A)+component (B)] / [component (C)] is from 1 / 199 to 60 / 40.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]This application claims priority from Japanese Patent Application No. 2011-096610, filed Apr. 22, 2011, the contents of which are hereby incorporated by reference in their entirety.BACKGROUND OF THE INVENTION[0002]1. Field of the Invention[0003]The present invention relates to a method for producing an antireflection film, an antireflection film, and a coating composition. More specifically, the present invention relates to a coating composition which is capable of forming a multilayer structure in a single coating step and has high production efficiency, a method for producing an antireflection film having a multilayer structure with two or more layers using the coating composition, and an antireflection film produced by the method.[0004]2. Description of the Related Art[0005]An antireflection film is arranged on the surface of a display and required to have a low reflectance in order to prevent decrease in the contrast due to reflection...

Claims

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Application Information

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Patent Type & AuthorityApplications(United States)
IPC IPC(8): G02B1/111B05D3/00C09D183/04B05D5/06B32B5/00G02B1/11B32B7/02B32B27/30C09C3/12C09D127/14C09D201/00G02B1/14
CPCB05D5/061G02B1/111Y10T428/24975Y10T428/3154C08K9/04C08K9/06C08L27/12B05D3/108B05D5/00B05D5/063
InventorAKUTAGAWA, NOBUYUKIYONEYAMA, HIROYUKIWAKIZAKA, DAIKI
OwnerFUJIFILM CORP