Laminate and method of producing the same, and gas barrier film and method of producing the same
Inactive Publication Date: 2018-01-04
TOPPAN PRINTING CO LTD
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- Abstract
- Description
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- Application Information
AI Technical Summary
Benefits of technology
The present invention improves the barrier properties of an atomic layer deposition film by providing sufficient adsorption sites on the surface of a polymer undercoat layer, which acts as a substrate for the atomic layer deposition film. This ensures a better quality of the film and its performance in various applications.
Problems solved by technology
That is, when an atomic layer deposition film is formed on the substrate made of a polymer material by means of ALD, there is a risk that gas may pass through a plurality of gaps that constitute the atomic layer deposition film from the surface of the atomic layer deposition film toward the substrate.
In other words, when the atomic layer deposition film is formed on the substrate made of a polymer material by means of ALD, there is a risk that the atomic layer deposition film does not have the desired gas barrier properties.
Method used
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example 1
[0152]Test examples, Examples, and Comparative Examples of the present invention will be described below. However, the present invention is not limited in any way by the following examples.
[0153]
[0154]With reference to FIG. 1, a method of producing the laminate of Example 1 will be described.
[0155]First, a Ta2O5 layer having the thickness of 20 nm was formed as the undercoat layer 12 by sputtering on the surface 11a of the substrate 11 made of a polyethylene terephthalate (PET) film (model No. A4100, manufactured by Toyobo Co., Ltd.) having the thickness of 100 μm. The pre-deposition pressure was 5×10−4 Pa. During deposition, Ar was introduced into a deposition chamber at 30 sccm, and O2 was introduced at 10 sccm. The pressure during deposition was 2.5×10−1 Pa. A Ta target was used as a sputtering target, and film deposition was performed at constant power of 300 W. Here, the voltage was 610 V, electric current was 0.51 A, rotation speed of the stage was 6 rpm, and target-stage dist...
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Abstract
A laminate that improves barrier properties of an atomic layer deposition film in spite of use of a substrate made of a polymer material, and provides a gas barrier film and a method of producing the same. The laminate includes: a substrate made a polymer material; an undercoat layer disposed on at least part of a surface of the substrate and made up of an inorganic material containing Ta; and an atomic layer deposition film disposed so as to cover a surface of the undercoat layer.
Description
CROSS-REFERENCE TO RELATED PATENT APPLICATIONS[0001]This application is a continuation application filed under 35 U.S.C. §111(a) claiming the benefit under 35 U.S.C. §§120 and 365(c) of International Application No. PCT / JP2016 / 001509, filed on Mar. 16, 2016, which is based upon and claims the benefit of priority of Japanese Patent Application No. 2015-053395, filed on Mar. 17, 2015, the entireties of which are hereby incorporated by reference.TECHNICAL FIELD[0002]The present invention relates to a laminate and a method of producing the same, and a gas barrier film and a method of producing the same. More specifically, the present invention relates to a laminate including a substrate made of a polymer and a method of producing the laminate, and a gas barrier film including the laminate and a method of producing the gas barrier film.BACKGROUND[0003]Methods for forming a thin film on the surface of an object using a gaseous phase in which substances can move at an atomic or molecular l...
Claims
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Patent Timeline
Login to View More IPC IPC(8): C23C14/20C23C16/455C23C16/40
CPCC23C14/20C23C16/45525C23C16/40B32B9/00C23C14/0036C23C14/083C23C14/34C23C16/0272C23C16/402C23C16/403C23C16/405C23C16/4554C23C16/45555C23C16/545C23C28/04
Inventor KOYAMA, HIROSHISATO, JINKANO, MITSURU
Owner TOPPAN PRINTING CO LTD