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Copolymer and associated layered article, and device-forming method

a technology of layered articles and copolymers, applied in the direction of fluorescence/phosphorescence, optically investigating flaws/contamination, and investigating moving fluids/granular solids, etc., can solve the problem of significant deterioration of imaging performan

Inactive Publication Date: 2018-09-06
THE UNIV OF QUEENSLAND +1
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  • Claims
  • Application Information

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The patent describes various ways to do something. The technical effect of these inventions is that they help to improve the efficiency or accuracy of the underlying tasks they are designed for.

Problems solved by technology

Sources of EUV radiation also produce longer wavelength radiation—so-called out-of-band (OOB) radiation—that can significantly deteriorate imaging performance.

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  • Copolymer and associated layered article, and device-forming method
  • Copolymer and associated layered article, and device-forming method
  • Copolymer and associated layered article, and device-forming method

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[0053]Table 1 provides chemical structures and acronyms of monomers used in topcoat copolymer and photoresist copolymer synthesis.

TABLE 1PEGMABzMAHFACHOH

[0054]Synthesis of Poly(PEGMA-co-BzMA-co-HFACHOH) statistical copolymer by the RAFT technique. A reaction scheme for the RAFT synthesis of poly(PEGMA-co-BzMA-co-HFACHOH) is presented in FIG. 1. PEGMA (4.75 gram, 0.01 mole), benzyl methacrylate (BzMA, 1.76 gram, 0.01 mole), HFACHOH (1.67 gram, 0.005 mole), 4-cyano-4-[(dodecylsufanylthiocarbonyl)sulfanyl]pentanoic acid (CDTPA, RAFT agent, 221.8 milligrams (91% pure), 5×10−4 mole), azoisobutyronitrile (AIBN, initiator, 8.2 milligrams, 5×10−5 mole) and 1,4-dioxane (15 milliliters) were introduced in a 50 milliliter Schlenk flask equipped with a magnetic stirrer ([M]0:[mCTA]0:[Init]0=50:1:0.1, [PEGMA]:[BzMA]:[HFACHOH]=2:2:1). The reaction mixture was purged with argon for 30 minutes in an ice bath to remove oxygen, and then heated at 70° C. The monomer conversion was calculated by 1H NMR...

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Abstract

A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]This application is a continuation of U.S. patent application Ser. No. 14 / 820,699, filed Aug. 7, 2015 in the United States Patent and Trademark Office (USPTO), the contents of which is incorporated herein in its entirety by reference.FIELD[0002]The present invention relates to a copolymer, a photolithographic topcoat layer containing the copolymer, a layered article comprising the topcoat layer, and a method of forming an electronic device wherein the method utilizes the topcoat layer.INTRODUCTION[0003]Extreme ultraviolet (EUV) lithography and electron-beam lithography are promising technologies for patterning at scales of 20 nanometers and less. Sources of EUV radiation also produce longer wavelength radiation—so-called out-of-band (OOB) radiation—that can significantly deteriorate imaging performance. There is therefore a need for compositions that can reduce the negative impact of out-of-band radiation without unduly compromising other...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): G01N21/64G01N21/84A24B13/00A24B15/10B07C5/342B07C5/36B65G27/00C10L1/00G01N21/359G01N21/55G01N21/95G01N21/94G01N21/85A24B1/04G01N21/952
CPCG01N2021/6439C10L1/003G01N2021/8466G01N21/84G01N21/6486A24B13/00A24B15/10G01N2021/6417G01N21/95B07C2501/0018B65G27/00G01N2021/8592G01N2021/845G01N2021/8411G01N2021/646C10N2240/56G01N21/952G01N21/94G01N21/85G01N21/55G01N21/359B07C5/366B07C5/3427A24B1/04G01N21/6428C08F283/065C09D151/08G03F7/20C08F2438/03C08F220/286C08F220/1807C08F220/14C08F220/22G03F7/091C08F2/48G03F7/70033H01L21/0273C08F220/18G03F7/094C08F220/281C10N2040/42B05D1/005
Inventor THACKERAY, JAMES W.DU, KETREFONAS, III, PETERBLAKEY, IDRISSWHITTAKER, ANDREW KEITH
Owner THE UNIV OF QUEENSLAND