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Liquid crystal device, liquid crystal display panel and method for manufacturing the same

a liquid crystal display panel and liquid crystal technology, applied in non-linear optics, instruments, optics, etc., can solve problems such as leakage current, and achieve the effects of avoiding concave etching stoppers, precise alignment, and long tim

Inactive Publication Date: 2006-06-13
IBM CORP +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Benefits of technology

[0010]As the result of researches to remove the above disadvantages, the present inventors have eventually found the present invention. An object of the present invention is to reduce the number of steps, especially the number of exposing steps in manufacture of a liquid crystal device, so as to improve the productivity and reduce the manufacturing cost.
[0011]Another object of the present invention is to prevent a failure of a transistor related to an etching stopper portion, so as to improve the yield and the quality of a liquid crystal display panel.

Problems solved by technology

When a side surface extending along current flow is oppositely tapered, a leakage current can be caused owing to a remaining impurity and the like.

Method used

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  • Liquid crystal device, liquid crystal display panel and method for manufacturing the same
  • Liquid crystal device, liquid crystal display panel and method for manufacturing the same
  • Liquid crystal device, liquid crystal display panel and method for manufacturing the same

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Embodiment Construction

[0041]Now, a preferred embodiment of a liquid crystal device, a liquid crystal display panel and a method of manufacturing the device and the display panel will be described with reference to the accompanying drawings. It is noted that only a portion corresponding to one pixel is shown in the drawings for simplification. In addition, the sectional views illustrate, in principle, a TFT portion, a storage capacitance portion Cs and a pad portion for simplifying the description.

[0042]As shown in FIGS. 1(a) and 1(b), a gate electrode 4 (to be connected to a gate line in practice) is first formed on a transparent substrate 2. The most preferable transparent substrate 2 is a glass substrate, but can be a resin substrate or a flexible substrate as far as it is transparent and, in particular, good at heat resistance.

[0043]The gate electrode 4 consists of one or more layers of at least one element selected from the group consisting of MoW, Cr, Cu, Ni, Al, Mo, Ag and the like. Preferably, the...

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Abstract

A method of manufacturing a liquid crystal panel comprises the steps of forming a gate insulating film, a channel layer and an etching stopper layer on a transparent substrate bearing a gate electrode, exposing the substrate to light from its back surface side by using the gate electrode as a light shielding mask by photolithography, developing the resist, etching the etching stopper layer, forming a source / drain layer, and etching the source / drain layer and a remaining part of the etching stopper by chemical gas phase etching.

Description

[0001]This is a divisional of U.S. Ser. No. 09 / 409,266 filed Sep. 30, 1999 now U.S. Pat. No. 6,465,285, the contents of which are incorporated herein in its entirety.BACKGROUND OF THE INVENTION[0002]1. Field of the Invention[0003]The present invention relates to an a-Si TFT liquid crystal device, a liquid crystal display panel and a method of manufacturing them.[0004]2. Description of Related Art[0005]A conventional method for manufacturing an a-Si TFT liquid crystal display panel will now be described with regard to one liquid crystal device portion. As shown in FIGS. 15(a) and 15(b), a gate electrode 4 is first formed into a predetermined shape on a glass substrate 2 by a general technique. Then, as shown in FIG. 16, a gate insulating film 6, a channel layer 8 and a SiNx film 10 serving as an etching stopper layer are successively stacked on the entire surface of the glass substrate 2. As shown in FIGS. 17(a), 17(b) and 17(c), after coating a resist on the SiNx film 10, the glass ...

Claims

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Application Information

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Patent Type & Authority Patents(United States)
IPC IPC(8): H01L29/04G02F1/1343G02F1/136G02F1/1368H01L21/336H01L29/49H01L29/786
CPCG02F1/1368H01L29/78633H01L29/66765H01L29/78609G02F2001/136231H01L29/4908G02F1/136231G02F1/1343
Inventor TOKUHIRO, OSAMUUEDA, HIROYUKIMACHIDA, MASAHIKO
Owner IBM CORP
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