Method for manufacturing dies formed with a dielectric layer
a technology of dielectric layer and manufacturing method, which is applied in the direction of semiconductor devices, electrical equipment, basic electric elements, etc., can solve the problems of unavoidable dimension shrinkage due to curing, high cost of solid films, and easy contamination of wafers, so as to reduce the cost
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[0017]With reference to the attached drawings, the present invention is described by means of the embodiment(s) below where the attached drawings are simplified for illustration purposes only to illustrate the structures or methods of the present invention by describing the relationships between the components and assembly in the present invention. Therefore, the components shown in the figures are not expressed with the actual numbers, actual shapes, actual dimensions, nor with the actual ratio. Some of the dimensions or dimension ratios have been enlarged or simplified to provide a better illustration. The actual numbers, actual shapes, or actual dimension ratios can be selectively designed and disposed and the detail component layouts may be more complicated.
[0018]According to the first embodiment of the present invention, a method of manufacturing dies formed with a dielectric layer is illustrated in FIG. 2 for process flow block diagram and FIGS. 3A to 3G for the cross-sectiona...
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