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Method for preparing micron planar bravais lattice or chain lattice on polymer surface

A Vibravid and polymer technology, which is applied in the field of preparation of submicron two-dimensional Bravais lattices and chain arrays on polymer surfaces, can solve the problem of difficulty in easily regulating the type of surface lattices, high cost and expensive lithography preparation. Photolithography technology and other issues, to achieve the effect of a wide range of applicable materials, simple process, and low equipment requirements

Inactive Publication Date: 2007-12-26
NANJING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the preparation methods of periodic surface microstructure mainly include photolithography, microprinting, stamping and other technologies, but the preparation cost of photolithography is high.
Although micro-printing, impressions, etc. can be replicated in large areas, the required molds still rely on expensive photolithography technology. More importantly, the above-mentioned technologies are difficult to conveniently control the type of surface lattice

Method used

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  • Method for preparing micron planar bravais lattice or chain lattice on polymer surface
  • Method for preparing micron planar bravais lattice or chain lattice on polymer surface
  • Method for preparing micron planar bravais lattice or chain lattice on polymer surface

Examples

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Effect test

Embodiment 1

[0018] Embodiment 1: The present invention includes the design and determination of the stamping process of self-assembly combined with heat treatment technology; the preparation method of two-dimensional Bravais lattice and chain array on the surface of submicron polymer. The steps are:

[0019] 1. Using self-assembly technology to integrate SiO 2 The microspheres are arranged on the surface of polycarbonate, and then heat-treated at 140-180°C for 1min-24h, and after natural cooling, SiO 2 The template is removed to obtain the desired impression. The stamp is placed on the surface of another polymer polyolefin film, and treated at 100-140°C for 1min-60min, and the two-dimensional hexagonal lattice structure on the polymer surface can be obtained after demoulding.

[0020] 2. By stretching the polymer film prepared above to different amounts along the [10] or [11] direction of the two-dimensional hexagonal lattice, two-dimensional Bravais lattices of different lattice types ...

Embodiment 2

[0021] Embodiment 2: utilize self-assembly technology to SiO 2 The microspheres were arranged on the surface of polyamide, and then heat-treated at 160 °C for 5 h, and after natural cooling, the SiO 2 The template is removed to obtain an impression. Place the stamp on the surface of the polyethylene film and treat it at 120°C for 30 minutes. After demoulding, a two-dimensional hexagonal lattice structure on the surface of the polyene can be obtained, as shown in Figure 2(A).

[0022] The stretch ratio of the above film along the [10] direction of the hexagonal lattice is 0.414, and then the stretch ratio along the obtained tetragonal [10] direction is 0.25 to obtain a rectangular lattice, as shown in Figure 2(B).

Embodiment 3

[0023] Example 3: stretch the film in Example 2 to 0.414 along the hexagonal lattice [10] direction to obtain a tetragonal lattice, as shown in Figure 2(C).

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Abstract

The invention discloses a method for preparing the surface sub-micron two-dimensional Brawa spot lattice and chain lattice of polymer, belonging to the nanometer / micron micro-structural material and preparing technique. The invention selects the polymer from polyalkenes, polyester, and polyamide which have significant yield force; and the two-dimensional Brawa spot lattice comprises al two-dimensional basic Brawa lattice as hexagonal, cubic, rectangle, diamond, and rhombic. The preparing method utilizes the die-stretching method, which first utilizes the colloid crystal mould and the heat treatment technique to prepare the sub-micro mould; removing mould via heat pressure to prepare the sub-micro hexagonal lattice; and preparing the lattice and chain structure as hexagonal, cubic, rectangle, diamond, and rhombic via controllable stretching. The invention can prepare all kinds of two-dimensional Brawa lattice while the width of lattice can be accurately adjusted.

Description

1. Technical field [0001] The invention relates to a method for preparing a submicron two-dimensional Bravais lattice and chain array on a polymer surface. 2. Background technology [0002] Two-dimensional micron periodic surface microstructure is a technology with important application background. Due to the periodicity of the array and the wide range of available materials, the two-dimensional submicron periodic surface microstructure exhibits novel optical, electrical, magnetic, catalytic and special surface properties, and is widely used in information storage, photoelectrochemical catalysis, sensors, and antifouling. and other fields have broad application prospects. The surface microstructure of two-dimensional micron periodic polymers also has important scientific research value and application prospects. For example, changing the surface morphology of polymers can continuously adjust its hydrophobic performance in a large range; the surface microstructure of polymer...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B29D11/00B29C71/02B29K69/00B29K77/00B29K59/00B29K61/00B29K23/00B29K67/00
Inventor 王振林祝名伟闵乃本
Owner NANJING UNIV