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Laser crystallization apparatus and laser crystallization method

A technology of laser crystallization and crystallization optics, used in electrical components, semiconductor/solid-state device manufacturing, circuits, etc.

Inactive Publication Date: 2008-11-12
ADVANCED LCD TECH DEVMENT CENT
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0021] The problems and concerns described above can be solved by the laser crystallization apparatus and laser crystallization method set forth below

Method used

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  • Laser crystallization apparatus and laser crystallization method
  • Laser crystallization apparatus and laser crystallization method
  • Laser crystallization apparatus and laser crystallization method

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Embodiment Construction

[0033] Embodiments of the present invention will be described with reference to the drawings. The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate the accompanying drawings of embodiments of the invention and, together with the general description given above and the detailed description of the embodiments given below, explain the principles of the invention. Corresponding parts are indicated by the same reference numerals throughout the drawings. These embodiments are merely examples, and various changes and modifications can be made without departing from the scope and fine blanking of the present invention.

[0034] In the ELA apparatus, in order to observe or measure images of crystallization process regions of several μm in real time, where semiconductor films are melted and crystallized in hundreds of nanoseconds, it is necessary to conform to the optical system from the excimer laser crystallization used for crysta...

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Abstract

A laser crystallization apparatus, which enables an observation of a high spatial resolution with several mum and a high temporal resolution with several nanoseconds, comprising a crystallization optical system to irradiate a laser light to a thin film provided on a substrate and to melt and crystallize the thin film, the laser crystallization apparatus comprises an illumination light source disposed out of an optical path of the laser light and emitting an illumination light for observation to illuminate the thin film, an illumination optical system comprising an annular optical element which has the optical path of the laser light in the center and which leads the illumination light from the illumination light source to the thin film along the optical path, and an observation optical system which displays a magnified image of the substrate including the thin film.

Description

technical field [0001] The present invention relates to a crystallization apparatus and a crystallization method for irradiating laser light onto a thin film such as a semiconductor film, and more particularly to a laser crystallization apparatus and a laser crystallization method in which melting of a semiconductor film can be observed in real time with an enlarged image and crystallization process. Background technique [0002] A laser crystallization technique has been developed in which, for example, a high-energy short-pulse laser is used to melt and crystallize a semiconductor film so that a non-single-crystal film such as an amorphous or polycrystalline semiconductor film becomes a crystalline film including regions with large crystal grains. For example, this technique is used for crystallization of non-single crystal semiconductor films used as thin film transistors of display devices such as liquid crystal display devices and organic electroluminescent display devi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00H01L21/20
Inventor 高见芳夫
Owner ADVANCED LCD TECH DEVMENT CENT