Solid imaging device
A solid-state imaging device, pixel technology, applied in radiation control device, signal generator with a single pickup device, image communication, etc., can solve the problem of reducing the number of photoelectric conversion elements, storage time, storage time, etc. problem, to achieve high image quality, prevent the reduction of sensitivity, and achieve the effect of high practical value
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Embodiment approach 1
[0060] figure 2 It is a schematic diagram showing the circuit configuration of the solid-state imaging device according to the first embodiment. In addition, the example shown in the figure shows a case where there are two pixel portions (photoelectric conversion elements) arranged in the row direction.
[0061] Such as figure 2 As shown, the solid-state imaging device 1 includes: pixel portions 11a and 11b; a plurality of MOS transistors Q1a, Q1b, Q2a, Q2b, Q3a, Q3b, Q4a, Q4b, Q5a, Q5b, Q6a, Q6b, Q7, Q8a, Q8b, Q9a , Q9b; multiple capacitors C1a, C1b, C2a, C2b; line scanning circuit section 12; driving pulse application terminals P1, P2, P3, P4, P5, P6, P7, P8, the driving pulse application terminal is applied from the figure Drive pulses for the column scanning circuit section or signal readout circuit section not shown; bias voltage application terminals P11 and P12 to which the bias voltage from the column scanning circuit section or signal readout circuit section is applied...
Embodiment approach 2
[0097] Next, another solid-state imaging device according to the present invention will be described.
[0098] Figure 7 It is a circuit diagram showing the structure of the solid-state imaging device shown in the second embodiment. Here, as described above, in the solid-state imaging device 1, the signal value output to the signal output line L1 is divided by the capacitor C9, so there is loss.
[0099] Therefore, in the solid-state imaging device 2 according to the second embodiment, as Figure 7 As shown, in addition to the structure of the solid-state imaging device 1, it also includes a high input impedance circuit 13, which is connected between the source of the MOS transistor Q4b and the drain of the MOS transistor Q7.
[0100] As a result, the signal value output to the signal output line L1 is not divided by the capacitor C9, but has two Figure 7 In the case of the storage circuit of the structure, the signal value is 2×Vt, and in the case of N storage circuits, the sig...
Embodiment approach 3
[0107] Next, another solid-state imaging device of the present invention will be described.
[0108] Picture 9 It is a circuit diagram showing the configuration of the solid-state imaging device according to the third embodiment. Such as Picture 9 As shown, the solid-state imaging device 3 is applicable when two pixel units (photoelectric conversion elements) are arranged in the column direction. The solid-state imaging device 3 includes: pixel units 30a and 30b; MOS transistors Q1, Q2, Q6, Q11a, Q11b, Q12a, Q12b, Q13a, and Q13b; capacitors C1, C3a, C3b; buffer 31; row scan circuit section 32; drive pulse application terminals P21, P22, P23a, P23b, P24a, P24b, and P25; bias application terminals P31 and P32; and signal output lines L2 and L3, etc.
[0109] The pixel sections 30a and 30b include a photoelectric conversion element, a charge transfer section, a charge-voltage conversion section, a voltage amplification section, and the like. Picture 9 In this, the detailed circui...
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