Unlock instant, AI-driven research and patent intelligence for your innovation.

Electronic optical focusing, deflexion and signals collection method for the turning gear immerged object lens

An immersion and deceleration electric field technology, which is applied in the directions of radiation conversion chemical element devices, beam/ray deflection devices, beam/ray focusing/reflection devices, etc. , Increase the turnaround time of integrated circuits and other issues, to achieve the effect of improving signal quality, high resolution, and reducing time

Inactive Publication Date: 2009-12-02
ASML NETHERLANDS BV
View PDF2 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, detection can only be performed simultaneously on relatively small sample portions without repositioning the sample
Second, the time required to inspect, view and measure a sample is substantially long because of the inherently small deflection range
This not only results in increased IC turnaround time, but also increases the cost of process, test, inspection, troubleshooting and production

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Electronic optical focusing, deflexion and signals collection method for the turning gear immerged object lens
  • Electronic optical focusing, deflexion and signals collection method for the turning gear immerged object lens
  • Electronic optical focusing, deflexion and signals collection method for the turning gear immerged object lens

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] figure 1 An embodiment of a scanning electron microscope 100 according to the invention is shown. In this embodiment, a scanning electron microscope 100 includes a particle beam source 102 having a virtual source point 104 (i.e., an effective source point for particles), an anode 106 having a magnetic lens therein and a plurality of deflection units 120a-120e The objective lens system 112 . For reference purposes, a beam axis 109 is defined as the line connecting the particle beam source 102 to the sample 122 and is designated as the Z-axis, with the X and Y-axes defining a plane transverse to the Z-axis.

[0023] The magnetic lens includes a material 110 and an excitation coil 115 for providing magnetic power to a magnetic circuit with field lines passing through the magnetic material and between pole faces 116 and 114 . The central cavity of the magnetic lens has the shape of a circular bucket, which is axisymmetric with respect to the Z-axis. Where the primary par...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A four-turn deceleration immersion method that provides a low-voltage electron beam with large beam current, considerable spatial resolution, considerable scanning range, and high signal collection efficiency. The objective includes a magnetic lens for generating a magnetic field near the sample to focus the particles of the particle beam onto the sample, and electrodes for providing a deceleration field near the sample to the potential of the particle beam when the beam collides with the sample. To reduce the energy of the particle beam; a deflection system including a plurality of deflection units arranged along the beam axis for deflecting the particle beam to make scanning on a sample with a large area possible, at least one of the deflection units is placed on the In the deceleration field of the beam, the remaining deflection units are placed in the central cavity of the magnetic lens; and an annular detection unit with a fairly small aperture is placed below the aperture defining the main beam to capture secondary electrons (SE) and backscatter Lining Electronics (BSE).

Description

[0001] This application is a divisional application with the filing date of "March 21, 2002", the application number of "02828993.5", and the title of "Electron Optical Focusing, Deflection and Signal Collection System and Method of Swivel Deceleration Submerged Objective Lens". technical field [0002] The present invention generally relates to a scanning electron microscope, and in particular relates to a focusing and deflection system and method of a rotary deceleration submerged objective lens electron optics. range, and high signal capture efficiency. Background technique [0003] Scanning electron microscopes are used in many applications where the very small structures of objects need to be examined in great detail. Some of these applications include applications such as defect viewing and inspection of samples of very large scale integrated (VLSI) circuits, or chips, or other objects, the determination of detailed critical dimensions in these samples, and the design ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/141H01J37/147H01J37/28H01J47/00G01N23/00G21G5/00H01J3/14H01J3/26H01J37/244
CPCH01J37/14H01J37/141H01J37/147H01J37/1475H01J37/244H01J37/28H01J2237/1035H01J2237/151H01J2237/2448H01J2237/2594
Inventor Z·-W·陈
Owner ASML NETHERLANDS BV