Unlock instant, AI-driven research and patent intelligence for your innovation.

Photoresist coater carrying disc for preventing static assembly

A technology of photoresist and coating machine, which is applied in optics, nonlinear optics, and photoplate-making process coating equipment, etc., and can solve problems such as damaging circuits, reducing the yield of glass substrates 92, and being damaged

Inactive Publication Date: 2010-02-24
E INK HLDG INC
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, when the step of coating photoresist is completed and the glass substrate 92 is separated from the vacuum chuck 91, the surface of the vacuum chuck 91 will generate high-voltage static electricity up to 15-16 kilovolts (Kilovolt, KV), and damage the glass substrate 92. If the circuit is damaged locally, the glass substrate 92 will be scrapped if it is serious, thus reducing the yield rate of the glass substrate 92.
[0007] Based on the shortcomings of the existing glass substrate photoresist coating machine that the vacuum chuck accumulates static electricity and damages the original circuit on the glass substrate, the inventor improves its shortcomings and defects, and then invents a photoresist coating machine that prevents static electricity from accumulating Carrier tray

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photoresist coater carrying disc for preventing static assembly
  • Photoresist coater carrying disc for preventing static assembly
  • Photoresist coater carrying disc for preventing static assembly

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033] Please refer to figure 1 and figure 2 , the photoresist coating machine carrying plate for preventing electrostatic accumulation of the present invention is connected with a transmission mechanism, and a vacuum pump is externally connected, and the whole is fixed on a platform 80, thereby forming a photoresist coating machine.

[0034] Please refer to figure 2 and image 3 , the photoresist coating machine carrying plate includes a tray 30 and a tray 30 fixed seat 20, wherein:

[0035] Both the tray 30 and the fixing seat 20 are conductors, and electrical conduction can be formed between the tray 30 and the fixing seat. The tray 30 can have components such as carbonaceous materials, graphite or metal, so that it has conductive properties. Preferably, the tray 30 The resistance may be 103-105 ohms (Ω) per square (ohms / sq).

[0036] Please refer to figure 2 and Figure 4 , the fixed base 20 is connected with the transmission mechanism on the coating machine thro...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
electrical resistanceaaaaaaaaaa
Login to View More

Abstract

The invention is a photoresist coater carrying disc able to prevent static congregation, comprising a tray and a fixed base fixed with the tray, where the tray and the fixed base are both conductors,and they form electric conduction between them, and the fixed base is connected with drive mechanism on the coater through a rotary shaft which is conductor, and driven by the drive mechanism, the drive mechanism has earthing establishment; thus, a static discharge path forms between the tray, fixed base, rotary shaft and earthing establishment of the drive mechanism, and when vacuum absorbed glass substrate on the tray completes photoresist coating, large amounts of static generated when the glass substrate instantly departs from the tray surface is released quickly through the static discharge path into the earth so as to be able to avoid static congregation from damaging the glass substrate.

Description

technical field [0001] The invention belongs to a device used in the manufacturing process of glass substrates, in particular to a photoresist coating machine carrying plate that prevents static electricity accumulation, and the coating machine carrying plate can prevent the glass substrate from being separated from the coating machine carrying plate. It is damaged by the static electricity generated at the moment of detachment to ensure the yield of the glass substrate. Background technique [0002] Liquid crystal screens have the advantages of being thin and light and do not take up space. At present, they have largely replaced traditional cathode ray tube screens and are widely used in various occasions. [0003] The core component of the liquid crystal screen is the glass substrate. In the manufacturing process of the liquid crystal panel, it is necessary to perform a semiconductor process on the glass substrate to make thin film transistors and circuits. The yellow ligh...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/16G02F1/1333
Inventor 郑瑞忠张谦圣
Owner E INK HLDG INC