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Method of manufacturing vitreous silica diffusion reaction furnace tube

A technology of diffusion reaction and manufacturing method, which is applied in manufacturing tools, glass manufacturing equipment, semiconductor/solid-state device manufacturing, etc., and can solve problems such as large dimensional tolerance, large ellipticity, and unevenness

Inactive Publication Date: 2007-08-08
江苏宏伟石英科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The existing continuous melting furnace has a small total amount of hot melting, dense product bubbles and gas lines, large dimensional tolerances, cracked and uneven incisions, large wall thickness deviation, and large ellipticity. It is only limited to the application of light source materials and is not applicable. semiconductor device use

Method used

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  • Method of manufacturing vitreous silica diffusion reaction furnace tube

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Embodiment Construction

[0009] A method for manufacturing a transparent quartz diffusion reaction furnace tube. The raw materials are put into the tungsten clamp pot 2 of the continuous melting furnace 1 for melting. The installed capacity of the continuous melting furnace is 190kw. The heating elements are divided into six groups, and the Y-shaped connection method is used to heat the tungsten grid. Assembled for 76 pieces, the diameter of the melted tungsten crucible 2 is φ540mm, the working temperature in the furnace is 2400℃~2500℃, and the height of the high temperature zone above the bottom stop table 5 of the tungsten crucible 2 is L=750mm~850mm. Automatic feeding to ensure that the height of the material layer in the furnace is H=1200mm. The working protective gas is a mixture of nitrogen and argon. The ratio of nitrogen and argon is 1:3. 320mm laser caliper with an accuracy of 0.001mm for pipe diameter and pipe wall measurement.

[0010] The diameter of the forming outlet of the material bloc...

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Abstract

The invention discloses a making method of transparent quartz dispersing reacting furnace pipe, which comprises the following steps: putting raw material into continuous fusing stove to fuse under 2400-2500 deg.c; setting the height of high temperature area in the tungsten copple at 750-850mm; falling raw material automatically; adopting nitrogen and argon gas with rate at 1: 3 as protective gas; drawing through pipe drawing machine continuously; testing pipe diameter and pipe wall through laser with metering path at 0-320mm and precision at 0.001mm; setting the moulding distance between 40mm and 60mm.

Description

technical field [0001] The invention relates to a quartz product, in particular to a method for manufacturing a transparent quartz diffusion reaction furnace tube for semiconductor devices. Background technique [0002] At present, research institutions and manufacturers at home and abroad use a two-step process to produce transparent quartz diffusion reaction furnace tubes for semiconductor devices, that is, two-step gas refining, electric melting, or two-step thermoforming. The two-step process is a hydrogen-oxygen flame Making lumps or blank tubes, and then melting them into shaped tubes is an intermittent production, which has a low yield and wastes resources. The total output rate of the gas smelting and electric melting two-step method is about 25%, and the total output rate of the thermoforming two-step method is about 31%. The existing continuous melting furnace has a small total amount of hot melting, dense product bubbles and gas lines, large dimensional tolerance...

Claims

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Application Information

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IPC IPC(8): C03B20/00C03B15/14C03B17/04H01L21/22H01L21/3115H01L21/00
CPCC03B17/04C03B5/02C03B20/00
Inventor 成士林谭锦和
Owner 江苏宏伟石英科技有限公司