Pulse reverse electrolysis of acidic copper electroplating solutions
A copper electroplating solution and electroplating solution technology, applied in jewelry and other fields, can solve problems such as poor metal distribution, large differences, and small thickness
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Embodiment 1
[0034] Embodiment 1 - prior art
[0035] The electroplating bath composition that adopts comprises following:
[0036] Copper Sulphate Pentahydrate 220g / l
[0037] Sulfuric acid 35g / l
[0038] Chloride None
[0039] Special additives Yes
[0040] Electroplating method: DC 25A / dm 2
[0041] Plating time 1 hour
[0042] The copper plating had a bright appearance and no pits, irregular pellets, or other defects were observed on the print cylinder surface.
Embodiment 2
[0044] The electroplating bath composition that adopts comprises following:
[0045] Copper Sulphate Pentahydrate 150g / l
[0046] Sulfuric acid 105g / l
[0047] Chloride 85mg / l
[0048] Polyethylene glycol (MW 12,000) 400mg / l
[0049] Bis-(propane-3-sulfonic acid) disulfide,
[0050] Disodium salt 35mg / l
[0051] Special Additives None
[0052] Electroplating method: average pulse 15A / dm 2
[0053] 38ms forward
[0054] 2ms reverse 2 times forward current
[0055] Plating time 1 hour
[0056] The copper plating had a bright appearance and no pits, irregular pellets, or other defects were observed on the print cylinder surface.
Embodiment 3
[0058] The electroplating bath composition that adopts comprises following:
[0059] Copper Sulphate Pentahydrate 150g / l
[0060] Sulfuric acid 105g / l
[0061] Chloride 85mg / l
[0062] Ethylene Oxide / Propylene Oxide
[0063] Copolymer (MW 12,000) 400mg / l
[0064] Mercaptopropanesulfonic acid,
[0065] Sodium salt 25mg / l
[0066] Special additives Yes
[0067] Electroplating method: average pulse 15A / dm 2
[0068] 20ms forward
[0069] 1ms reverse 2 times forward current
[0070] Plating time 1 hour
[0071] The copper plating had a bright appearance and no pits, irregular pellets, or other defects were observed on the print cylinder surface.
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